Dust particle diagnostics in rf plasma deposition of silicon and silicon oxide films
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Understanding the growth mechanism in molecular organic thin films is fundamental to their applications in organic electronics. We present an extensive study of the growth mechanism of pentacene thin films on silicon dioxide (SiO2) using atomic ...
Silicon and silicon nitride surfaces have been successfully terminated with carboxylic acid monolayers and investigated by atomic force microscopy (AFM) and scanning near-field optical microscopy (SNOM). On clean Si surface, AFM showed topographical variat ...
We have developed a new hybrid AFM probe combining an SU-8 polymer body with a full tungsten cantilever having a nanometric tip. The fabrication is based on surface micromachining a silicon wafer, where tungsten is sputter deposited in oxidation sharpened ...
Electron Beam Induced Deposition (EBID) allows deposition of three-dimensional micro- and nano-structures of conductive and insulating materials on a wide range of substrates. The process is based on the decomposition of molecules of a pre-selected precurs ...
We report on a study of pentacene thin-films grown by high vacuum deposition on silicon dioxide, using atomic force microscopy (AFM) and transmission electron microscopy (TEM). The nucleation density of pentacene islands on SiO2is found to rise ...
Medical grade poly(vinyl chloride) was modified by RF plasma-deposition of teflon-like coatings to create a platform for the physisorption of PEO-containing copolymers, Pluronics (R). Thin teflon-like coatings were deposited in an RF-plasma reactor by plas ...
Light Induced Chemical Vapour Deposition (LICVD) of titanium dioxide thin films is studied in this work. It is shown that this technique enables to deposit locally and selectively a chosen crystalline phase with a precise controlled thickness at low substr ...
We report the fabrication of high-finesse strongly coupled microcavities composed of a polystyrene film doped with the dye tetraphenyl-porphyrin zinc positioned between two high reflectivity dielectric mirrors. The bottom mirror was deposited by plasma enh ...
The optical emission spectroscopy technique is used to characterise the temporal behaviour of a pure silane plasma in the first 90 s after ignition of a static closed-chamber very high frequency glow discharge. Special interest is drawn to the formation of ...
The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than the mean free path of the molecules determined by the pressure ...
ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (ECOL-Non-standard) BENVENUTI G (BENV-Individual) AMOROSI S (AMOR-Individual) HALARY-WAGNER E (HALA-Individual)2002