Publication

Characterization of thin film stress for MEMS planarization

Publications associées (55)

Graph Chatbot

Chattez avec Graph Search

Posez n’importe quelle question sur les cours, conférences, exercices, recherches, actualités, etc. de l’EPFL ou essayez les exemples de questions ci-dessous.

AVERTISSEMENT : Le chatbot Graph n'est pas programmé pour fournir des réponses explicites ou catégoriques à vos questions. Il transforme plutôt vos questions en demandes API qui sont distribuées aux différents services informatiques officiellement administrés par l'EPFL. Son but est uniquement de collecter et de recommander des références pertinentes à des contenus que vous pouvez explorer pour vous aider à répondre à vos questions.

Connectez-vous pour utiliser Chat avec Graph Search

, ,

In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...

American Chemical Society2016

This project is focused on atomic layer deposition of aluminium oxide to fabricate suspended microchannel resonators. Few examples of the applications of such devices are blood analysis to detect cancerous cells or device cooling directly on the chip. The ...

2016

The TORCH time-of-flight detector

Christoph Frei

The TORCH time-of-flight detector is being developed to provide particle identification between 2 and 10 GeV/c momentum over a flight distance of 10 m. TORCH is designed for large-area coverage, up to 30 m(2), and has a DIRC-like construction. The goal is ...

Elsevier Science Bv2016

, , , ,

Stretchable biphasic conductors are formed by physical vapor deposition of gallium onto an alloying metal film. The properties of the photolithography-compatible thin metal films are highlighted by low sheet resistance (0.5 Ω sq−1) and large stretchability ...

Wiley-V C H Verlag Gmbh2016

Influence of doping in thermochromic V1−xWxO2 and V1−xAlxO2 thin films: Twice improved doping efficiency in V1−xWxO2

Jean-Louis Scartezzini, Andreas Schueler, Rosendo Sanjines, Antonio Paone

The parameters of thermal evaporation and magnetron sputtering deposition were optimized for fabrication of vanadium dioxide thin films. The O2 partial pressure during film deposition is critical for obtaining a pure VO2 phase. Thermochromic V1−xWxO2 (x = ...

Elsevier2015

Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

A key factor in engineering integrated optical devices such as electro-optic switches or waveguides is the patterning of thin films into specific geometries. In particular for functional oxides, etching processes are usually developed to a much lower exten ...

Amer Chemical Soc2015

Low-temperature (≤200 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-enhanced chemical vapor deposition to grow homo-epitaxial layers and ...

American Institute of Physics2014

Atomic-Layer-Deposited Transparent Electrodes for Silicon Heterojunction Solar Cells

Christophe Ballif

We examine damage-free transparent-electrode deposition to fabricate high-efficiency amorphous silicon/crystalline silicon heterojunction solar cells. Such solar cells usually feature sputtered transparent electrodes, the deposition of which may damage the ...

Ieee-Inst Electrical Electronics Engineers Inc2014

Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

Christophe Ballif, Quentin Thomas Jeangros, Duncan Thomas Lindsay Alexander, Stefaan De Wolf, Johannes Peter Seif, Bénédicte Demaurex

Low-temperature (

American Institute of Physics2014

The effect of an Al2O3 interlayer on the thermal conductance of metal (Al)/non-metal (diamond and silicon) interfaces is investigated using Time Domain ThermoReflectance (TDTR). Interlayers between 1.7 and 20 nm are deposited on oxygen-terminated diamond a ...

Wiley-Blackwell2014