Publication

Mechanical characterization of a new high-aspect-ratio near UV-photoresist

Publications associées (32)

Graph Chatbot

Chattez avec Graph Search

Posez n’importe quelle question sur les cours, conférences, exercices, recherches, actualités, etc. de l’EPFL ou essayez les exemples de questions ci-dessous.

AVERTISSEMENT : Le chatbot Graph n'est pas programmé pour fournir des réponses explicites ou catégoriques à vos questions. Il transforme plutôt vos questions en demandes API qui sont distribuées aux différents services informatiques officiellement administrés par l'EPFL. Son but est uniquement de collecter et de recommander des références pertinentes à des contenus que vous pouvez explorer pour vous aider à répondre à vos questions.

Connectez-vous pour utiliser Chat avec Graph Search

Study of Linear Coupling in NEMS

Maxime Pitteloud

Cantilever beams are used as mass sensing device of chemical analyte by measuring the shift in frequency. However there resolution is linked to their size. As it become increasingly hard to produce smaller device an alternative is to use mode localisation ...

2021

, , ,

This contribution focuses on the fabrication and characterization of microchannel plates made of hydrogenated amorphous silicon (AMCPs). Flexible fabrication processes and the semi-conducting nature of amorphous silicon could give these detectors the advan ...

2021

Development of a novel mechanical micro-engraving method for the high-aspect-ratio microstructures of an advanced window system

André Gabriel Kostro, Josef Andreas Schuler, Jing Gong, Antoine Robert Michel Delaunay

A transparent polymer film with embedded micro mirrors is developed, and it can be attached to a window glass pane for daylighting, improving visual comfort and reducing cooling load in buildings by redirecting sunlight. Despite existing cutting-edge techn ...

2018

, ,

The demand of high resolution diffractive optical elements (DOE) is growing. Smaller critical dimensions allow higher deflection angles and can fulfill more demanding requirements, which can only be met by using electron-beam lithography. Replication techn ...

Spie-Int Soc Optical Engineering2016

Direct imprinting of organic-inorganic hybrid materials into high aspect ratio sub-100 nm structures

Jürgen Brugger, Victor Javier Cadarso Busto, Thomas Kiefer, Vaida Auzelyte

The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithography (NIL) is addressed in this work. Thermal shrinkage is induced by cooling the structures below room temperature to avoid the issues commonly arising du ...

Springer Verlag2014

High Aspect Ratio Microstructures

Jérôme Béguin

The goal of this project is to find a substrate and parameters that allow the realisation of hight aspect ratio microstructures. We tried three substrates (Ti, Cr and Si), two photoresist thicknesses (50 and 100 [m]), two focalisation points (8 and 12 [m]) ...

2012

Opto-thermal actuation in double layer polymer microcantilevers

Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos

Photostructurable polymers, such as SU-8, have large potential impact on the field of MEMS/NEMS, allowing simple fabrication of plastic MEMS/NEMS devices with nearly vertical sidewalls and high aspect ratios using standard photolithographic procedures. Fun ...

2011

MAGNETIC NANOCRYSTAL MODIFIED EPOXY PHOTORESIST FOR MICROFABRICATION OF AFM PROBES

Jürgen Brugger, Cristina Martin Olmos

Nanocomposites based on an organic polymer and inorganic nanocrystals (NCs) represent a class of high impact functional materials able to convey the unique size and shape dependent properties of nano-objects to highly processable resists.[1] In this work, ...

2010

Electron-beam induced photoresist shrinkage influence on 2D profiles

Vasiliki Tileli

For many years, lithographic resolution has been the main obstacle in keeping the pace of transistor densification to meet Moore's Law. For the 32 nm node and beyond, new lithography techniques will be used, including immersion ArF (iArF) lithography and e ...

International Society for Optics and Photonics2010

Procedia Chemistry2010