Corrugated membranes for improved pattern definition with micro/nanostencil lithography
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Atomic layer deposition (ALD) is one of the premier methods to synthesize ultra-thin materials on complex surfaces. The technique allows for precise control of the thickness down to single atomic layers, while at the same time providing uniform coverage ev ...
Continuous development of thin film deposition technologies is essential for the fabrication of films that meet the specific requirements of their target applications and working conditions. Therefore, it is necessary to increase the number of accessible a ...
Hafnium Carbide (HfC) is a refractory ceramic known for its exceptional properties, making it suitable for a wide range of applications. This project investigates the potential utilization of HfC in Micro or Nano Electromechanical Systems (MEMS/NEMS) and e ...
Application of a single metal or alloy is often restricted by its properties from optimal combination of performance and cost. Therefore, there is a vast need of joining dissimilar metals for various applications in biomedical, aerospace, automobile and ma ...
Coating nano particles and other substrates for efficiency enhancement, protection and obtaining new atomic structures is a widespread research topic in catalysis and material synthesis. Thus far, different approaches of coating, ranging from simplest to s ...
The sputtering conditions for the deposition of the layers underneath active AlN films were analyzed for improving the quality of the active AlN, and the dependence of AlN deposition temperature on crystalline quality was investigated, where a reduced depo ...
Self-supporting thin films containing nanopores are very promising materials for use for multiple applications, especially in nanofiltration. Here, we present a method for the production of nanomembranes containing a 3D ordered network of nanopores in an a ...
One challenge for microcrystalline silicon (mu c-Si:H) deposition is to achieve high deposition rates while maintaining high quality films. In this work, an inductively-coupled plasma (ICP) is used to deposit mu c-Si:H on glass substrates by means of a nov ...
This project focused on optimization of the deposition of platinum (Pt) thin films or use in piezoelectric MEMS/NEMS devices. Theory of piezoelectric, DC and DC-pulsed sputtering and thin film characterization was studied. Two parameters were varied in the ...
The Future Circular Collider for hadrons (FCC-hh) is a proposed high-energy frontier particle accelerator, which would be built in a new ~100 km circumference tunnel and would enable proton-proton collisions at a centre-of-mass energy of 100 TeV. The basel ...