Single-photon and photon-number-resolving detectors based on superconducting nanowires

Nanowire superconducting single photon detectors (SSPDs) [1] are characterized by very high sensitivity in the near infrared (detection efficiency η up to 30%, for a dark count rate DK of few Hz), speed (up to ∼1 GHz repetition rate) and time resolution (jitter of 20 ps full width at half maximum, FWHM). They can be operated at temperatures near 4 K, so they can be packaged in cryogenic dipsticks or cryogen-free refrigerators. These features make SSPDs the most promising detectors for telecom-wavelength single-photon counting applications. The basic structure of an SSPD is a narrow (w=50 to 120 nm), thin (th∼4-10 nm) NbN superconducting nanowire folded in a meander pattern. The typical detector active area (i.e. the size of the pixel) is Ad=10 × 10 µm2 (which allows an efficient coupling with the core of optical fibers at telecom wavelengths) with filling factor (f, the ratio of the area occupied by the superconducting meander to the device total area) ranging from 40% to 60%. The meanders are embedded in a 50 Ω coplanar transmission line. At present, the SSPD detection efficiency is limited by its absorbance (α, the ratio of the number of photons absorbed in the nanowire to the number of incident photons on the device active area). Indeed, it has been shown that in the classic front-illumination configuration α cannot exceed 30%. Our approach to increase α consists in integrating SSPDs with advanced optical structures such as distributed Bragg reflectors (DBRs) and optical waveguides. This requires to transfer the challenging SSPD technology (i.e. the deposition of high-quality few-nm thick NbN films and the nano-patterning by electron beam lithography, EBL) from the usual comfortable substrates, i.e. sapphire and MgO, which are known to allow the deposition of few-nm thick NbN films of excellent quality, to an optical substrate like GaAs, on which DBRs and waveguides can be easily obtained. Our first task was then to optimize a process for the deposition of high-quality few-nm thick NbN films on GaAs and AlAs/GaAs-based DBRs. Because of the requirement of compatibility with GaAs, the substrate temperature used for the depositions is 400°C, in order to prevent As evaporation. As GaAs and DBRs are highly mismatched substrates, the deposition parameters were first optimized with respect to the superconducting properties of NbN films on MgO substrates, which allow the growth of high crystal quality NbN films at low temperature. This made easier to separate the influence of stoichiometry from that of microstructure. The optimized deposition parameters were then used to grow NbN films on GaAs and DBRs, under the reasonable assumption (later checked and confirmed) that changing the substrate would not produce a change in film stoichiometry, but only in its microstructure. NbN films ranging from 150nm to 3nm in thickness were then deposited on epitaxial-quality single crystal MgO, GaAs and DBRs structures. The deposition technique is the current contro