Interferometers: Applications and Lithography

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Description

This lecture covers the principles and applications of interferometers, such as Mach-Zehnder and Sagnac interferometers, including their use in measuring refractive index and rotation. It also discusses lithography techniques like interference lithography and EUV interference lithography for creating nanostructures. The instructor explains the control of aerial image contrast in interferometric lithography and showcases examples of 1D and 2D nanostructures created using these techniques.

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https://mediaspace.epfl.ch/media/0_bi6eqsh7

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Related concepts (22)

Interference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.

A common-path interferometer is a class of interferometers in which the reference beam and sample beams travel along the same path. Examples include the Sagnac interferometer, Zernike phase-contrast interferometer, and the point diffraction interferometer. A common-path interferometer is generally more robust to environmental vibrations than a "double-path interferometer" such as the Michelson interferometer or the Mach–Zehnder interferometer.

Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.

Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.