In this paper, we report on the properties of GaN films and AlGaN/GaN HEMT structures grown by molecular beam epitaxy on resistive Si(1 1 1) substrates. The properties of the GaN buffer layer and the AlGaN/GaN HEMTs are presented. Finally, both static and high-frequency performances of sub-micron gate length devices are analyzed demonstrating their RF power capability. (C) 2002 Elsevier Science B.V. All rights reserved.
Anna Fontcuberta i Morral, Lucas Güniat, Valerio Piazza, Wonjong Kim
Elison de Nazareth Matioli, Armin Jafari, Riyaz Mohammed Abdul Khadar, Minghua Zhu