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Hydrogen atoms introduced into a bulk of rare earth-transition metal compound influence the electronic structure of the material. Additional electrons are expected to change the number of free electrons per volume unit present in the system. Electron energ ...
We present results of the optical characterization of silicon photonic crystal waveguides and microcavities that are completely buried in a silicon dioxide cladding and are fabricated by deep ultraviolet (UV) lithography. The advantages of buried waveguide ...
We have developed an original time resolved cathodoluminescence (TRCL) set-up with temporal performances similar to those of conventional time resolved optical techniques, keeping the capability to get structural information through the secondary electron ...
Nanostencil lithography is a flexible, rapid and resistless patterning method based on a high-resolution shadow mask. It allows for a wide choice of materials and surfaces to be structured and on the contrary to deep-ultraviolet (DUV), x-ray, electron beam ...
Many potential applications in nanotechnology require virtually defect-free arrays of nanometre-scale particles over large areas. Guided self-assembly of colloidal particles on patterned templates has been shown to produce ordered arrays of colloidal parti ...
We present results of the optical characterization of silicon photonic crystal waveguides and microcavities that are completely buried in a silicon dioxide cladding and are fabricated by deep ultraviolet (UV) lithography. The advantages of buried waveguide ...
Two methods to fabricate artificial nanoscale mechanical devices are presented. One is based on the combination of local Ga+ doping of silicon by a focused ion beam and KOH etching. The second is based on the use of nanostencil as miniature shadow mask to ...
A simplified process to fabricate high aspect ratio nanostructures in silicon combining electron beam lithography and deep reactive ion etching (DRIE) is presented. A stable process (HARSiN) has been developed without the need for complicated resist/hard m ...
The smaller carbon cluster anions, Cn- (n = 2-11), and their monohydrides, CnH- have been studied previously using anion photoelectron spectroscopy. In many cases, vibrational structure is obsd., but much of the structure remains hidden due to the resoln. ...
The four-point probe is used for the measurement of the resistivity of thin metal or semiconductor films. There is an interest in miniaturization of the probes to obtain higher surface sensitivity, an increased spatial resolution and less damage to the sam ...
