Ultra-high vacuum (UHV) is the vacuum regime characterised by pressures lower than about . UHV conditions are created by pumping the gas out of a UHV chamber. At these low pressures the mean free path of a gas molecule is greater than approximately 40 km, so the gas is in free molecular flow, and gas molecules will collide with the chamber walls many times before colliding with each other. Almost all molecular interactions therefore take place on various surfaces in the chamber.
UHV conditions are integral to scientific research. Surface science experiments often require a chemically clean sample surface with the absence of any unwanted adsorbates. Surface analysis tools such as X-ray photoelectron spectroscopy and low energy ion scattering require UHV conditions for the transmission of electron or ion beams. For the same reason, beam pipes in particle accelerators such as the Large Hadron Collider are kept at UHV.
Maintaining UHV conditions requires the use of unusual materials for equipment. Useful concepts for UHV include:
Sorption of gases
Kinetic theory of gases
Gas transport and pumping
Vacuum pumps and systems
Vapour pressure
Typically, UHV requires:
High pumping speed — possibly multiple vacuum pumps in series and/or parallel
Minimized surface area in the chamber
High conductance tubing to pumps — short and fat, without obstruction
Use of low-outgassing materials such as certain stainless steels
Avoid creating pits of trapped gas behind bolts, welding voids, etc.
Electropolishing of all metal parts after machining or welding
Use of low vapor pressure materials (ceramics, glass, metals, teflon if unbaked)
Baking of the system to remove water or hydrocarbons adsorbed to the walls
Chilling of chamber walls to cryogenic temperatures during use
Avoiding all traces of hydrocarbons, including skin oils in a fingerprint — gloves must always be used
Hydrogen and carbon monoxide are the most common background gases in a well-designed, well-baked UHV system. Both Hydrogen and CO diffuse out from the grain boundaries in stainless steel.
This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.
The students will learn about the essential chemical, thermodynamic and physical mechanisms governing thin film growth, about the most important process techniques and their typical features, includin
The objective of the course is to expose PhD students to experimental measurement techniques and principles applied in front end research of condensed matter and nanophysics. Besides providing a solid
This course is designed to cover a series of important scientific aspects of surface science and to provide an in-depth review of their corresponding fundamentals. It is organised as a retreat over on
Surface diffusion is a general process involving the motion of adatoms, molecules, and atomic clusters (adparticles) at solid material surfaces. The process can generally be thought of in terms of particles jumping between adjacent adsorption sites on a surface, as in figure 1. Just as in bulk diffusion, this motion is typically a thermally promoted process with rates increasing with increasing temperature. Many systems display diffusion behavior that deviates from the conventional model of nearest-neighbor jumps.
Secondary-ion mass spectrometry (SIMS) is a technique used to analyze the composition of solid surfaces and thin films by sputtering the surface of the specimen with a focused primary ion beam and collecting and analyzing ejected secondary ions. The mass/charge ratios of these secondary ions are measured with a mass spectrometer to determine the elemental, isotopic, or molecular composition of the surface to a depth of 1 to 2 nm.
Angle-resolved photoemission spectroscopy (ARPES) is an experimental technique used in condensed matter physics to probe the allowed energies and momenta of the electrons in a material, usually a crystalline solid. It is based on the photoelectric effect, in which an incoming photon of sufficient energy ejects an electron from the surface of a material. By directly measuring the kinetic energy and emission angle distributions of the emitted photoelectrons, the technique can map the electronic band structure and Fermi surfaces.
We report the development of a continuous-wave and pulsed X-band electron spin resonance (ESR) spectrometer for the study of spins on ordered surfaces down to cryogenic temperatures. The spectrometer operates in ultra-high vacuum and utilizes a half-wavele ...
To characterize in detail the charge density wave (CDW) transition of 1T-VSe2, its electronic structure and lattice dynamics are comprehensively studied by means of x-ray diffraction, muon spectroscopy, angle resolved photoemission (ARPES), diffuse and ine ...
After decades of technological advancements, high-speed atomic force microscopy (HS-AFM) has emerged as a powerful technique for visualizing dynamic processes. At the nanoscale, the AFM provides valuable insights into the sample by sensing minute interacti ...