Publications related to Lithography

Thermomechanical nanocutting of 2D materials using thermal scanning probe lithography

Jürgen Brugger, Giovanni Boero, Xia Liu, Ana Conde Rubio, Samuel Tobias Howell

The rapidly evolving field of 2D materials has developed a plethora of emerging micro/nano devices where atomically-thin materials play a fundamental role. In most cases, this implies the need of nanostructuring them, but due to their delicate nature, conv ...

2020

Low-Temperature Screen-Printed Metallization for the Scale-Up of Two-Terminal Perovskite-Silicon Tandems

Christophe Ballif, Antonin Faes, Jacques Levrat, Gabriel Christmann, Bertrand Yves Paul Paviet-Salomon, Arnaud Walter, Nicolas Badel, Adriana Paracchino, Matthieu Despeisse, Sylvain Nicolay, Soo-Jin Moon, Laura Ding

Tandem photovoltaic devices based on perovskite and crystalline silicon (PK/c-Si) absorbers have the potential to push commercial silicon single junction devices beyond their current efficiency limit. However, their scale-up to industrially relevant sizes ...

AMER CHEMICAL SOC2019

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018

Unified rule based correction for corners in proximity lithography mask using high resolution features

Hans Peter Herzig, Toralf Scharf, Krishnaparvathy Puthankovilakam

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Elsevier2017

Coherence management in lithography printing systems

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

In proximity lithography, interference and diffraction effects arise when printing small features because of the proximity gap. Different techniques are used in order to control and take advantage of theses effects. In this paper, the focus is set on the M ...

Spie-Int Soc Optical Engineering2016

Post-cmos processing and 3d integration based on dry-film lithography

Carlotta Guiducci, Yusuf Leblebici, Yüksel Temiz

A method for performing a post processing pattern on a diced chip having a foot-print, comprises the steps of providing a support wafer; applying a first dry film photoresist to the support wafer; positioning a mask corresponding to the footprint of the di ...

2015

PDMS-based, magnetically actuated variable optical attenuators obtained by soft lithography and inkjet printing technologies

Jürgen Brugger, Victor Javier Cadarso Busto

This paper reports and compares the implementation of magnetic variable optical attenuators (M-VOA) by two fabrication strategies. In the first case, a two-layer structure containing a non-doped polydimethylsiloxane (PDMS) layer on a magnetic PDMS (M-PDMS) ...

Elsevier2014

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Hans Peter Herzig, Toralf Scharf, Qing Tan, David Nguyen, Krishnaparvathy Puthankovilakam

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Spie-Int Soc Optical Engineering2014

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Lithography

Template-assisted electrodeposition of nickel and nickel copper 3D microcomponents

Thermomechanical nanocutting of 2D materials using thermal scanning probe lithography

Low-Temperature Screen-Printed Metallization for the Scale-Up of Two-Terminal Perovskite-Silicon Tandems

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Unified rule based correction for corners in proximity lithography mask using high resolution features

Coherence management in lithography printing systems

Controlled DNA Patterning by Chemical Lift-Off Lithography: Matrix Matters

Post-cmos processing and 3d integration based on dry-film lithography

PDMS-based, magnetically actuated variable optical attenuators obtained by soft lithography and inkjet printing technologies

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

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Chat with Graph Search

Template-assisted electrodeposition of nickel and nickel copper 3D microcomponents

Controlled DNA Patterning by Chemical Lift-Off Lithography: Matrix Matters

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Coherence management in lithography printing systems

Post-cmos processing and 3d integration based on dry-film lithography

Thermomechanical nanocutting of 2D materials using thermal scanning probe lithography

Unified rule based correction for corners in proximity lithography mask using high resolution features

Low-Temperature Screen-Printed Metallization for the Scale-Up of Two-Terminal Perovskite-Silicon Tandems

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

PDMS-based, magnetically actuated variable optical attenuators obtained by soft lithography and inkjet printing technologies