Publications related to Stepper

Top-Down Technique for Scaling toNnano in Silicon MEMS

Yusuf Leblebici, Zuhal Tasdemir, Mustafa Yilmaz, Yasin Kilinc

Nanoscale building blocks impart added functionalities to microelectromechanical systems (MEMS). The integration of silicon nanowires with MEMS-based sensors leading to miniaturization with improved sensitivity and higher noise immunity is one example high ...

American Vacuum Society2017

Surface 3D Micro Free Forms: Multifunctional Microstructured Mesoporous alpha-Alumina by in Situ Slip Casting Using Excimer Laser Ablated Polycarbonate Molds

Paul Bowen, Patrik Willi Hoffmann, Sriharitha Rowthu

Ceramic surface microstructuring is a rapidly growing field with a variety of applications in tribology, wetting, biology, and so on. However, there are limitations to large-area microstructuring and fabrication of three-dimensional (3D) micro free forms. ...

Amer Chemical Soc2015

Post-cmos processing and 3d integration based on dry-film lithography

Carlotta Guiducci, Yusuf Leblebici, Yüksel Temiz

A method for performing a post processing pattern on a diced chip having a foot-print, comprises the steps of providing a support wafer; applying a first dry film photoresist to the support wafer; positioning a mask corresponding to the footprint of the di ...

2015

Self-aligned normally-off metal-oxide-semiconductor n(++)GaN/InAlN/GaN high electron mobility transistors

Nicolas Grandjean, Jean-François Carlin

Self-aligned normally-off n(++)GaN/InAlN/AlN/GaN MOS HEMTs with a recessed gate show scalable threshold voltage between 1.3 to 3.7V, which increases with the gate oxide thickness. Al2O3 or HfO2 gate insulators were grown by ALD at 100 degrees C so that one ...

Wiley-V C H Verlag Gmbh2015

Superhard, Antireflective Texturized Coatings Based on Hyperbranched Polymer Composite Hybrids for Thin-Film Solar Cell Encapsulation

Christophe Ballif, Yves Leterrier, Franz-Josef Haug, Andreas Schueler, Marina Aymara González Lazo

In this study, we demonstrate by simulation and experiment the antireflective (AR) performance of hyperbranched polymer (HBP) nanocomposites textures replicated from a moth-eye pattern using ultraviolet (UV) nanoimprint lithography. A UV-curable acrylated ...

2015

Study of bending reliability and electrical properties of platinum lines on flexible polyimide substrates

Nico de Rooij, Danick Briand, Jérôme Courbat, Francisco Molina Lopez

We have experimentally studied the variation in electrical resistance of flexible platinum lines patterned on polyimide foil when they are subjected to circular bending constraints. The lines were patterned by means of standard photolithography and sputter ...

Elsevier2014

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Hans Peter Herzig, Toralf Scharf, Qing Tan, David Nguyen, Krishnaparvathy Puthankovilakam

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Spie-Int Soc Optical Engineering2014

A CMOS-Compatible, Low-Loss, and Low-Crosstalk Silicon Waveguide Crossing

Yi Zhang, Christophe Marcel Georges Galland

We demonstrated a waveguide crossing for submicron silicon waveguides with average insertion loss of 0.18±0.03 dB and crosstalk of -41±2 dB, uniform across an 8-inch wafer. The device was fabricated in a CMOS-compatible process using 248 nm lithography, wi ...

Institute of Electrical and Electronics Engineers2013

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Stepper

Limitations of Proximity Lithography Printing

Top-Down Technique for Scaling toNnano in Silicon MEMS

Surface 3D Micro Free Forms: Multifunctional Microstructured Mesoporous alpha-Alumina by in Situ Slip Casting Using Excimer Laser Ablated Polycarbonate Molds

Post-cmos processing and 3d integration based on dry-film lithography

Self-aligned normally-off metal-oxide-semiconductor n(++)GaN/InAlN/GaN high electron mobility transistors

Superhard, Antireflective Texturized Coatings Based on Hyperbranched Polymer Composite Hybrids for Thin-Film Solar Cell Encapsulation

Nano SAW Devices For Sensing Applications

Study of bending reliability and electrical properties of platinum lines on flexible polyimide substrates

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

A CMOS-Compatible, Low-Loss, and Low-Crosstalk Silicon Waveguide Crossing

Graph Chatbot

Chat with Graph Search

Post-cmos processing and 3d integration based on dry-film lithography

Limitations of Proximity Lithography Printing

Nano SAW Devices For Sensing Applications

Top-Down Technique for Scaling toNnano in Silicon MEMS

Study of bending reliability and electrical properties of platinum lines on flexible polyimide substrates

Surface 3D Micro Free Forms: Multifunctional Microstructured Mesoporous alpha-Alumina by in Situ Slip Casting Using Excimer Laser Ablated Polycarbonate Molds

Self-aligned normally-off metal-oxide-semiconductor n(++)GaN/InAlN/GaN high electron mobility transistors

Superhard, Antireflective Texturized Coatings Based on Hyperbranched Polymer Composite Hybrids for Thin-Film Solar Cell Encapsulation

A CMOS-Compatible, Low-Loss, and Low-Crosstalk Silicon Waveguide Crossing

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization