Concept
Chemical vapor deposition
Related publications (1,000)
Optimizing Atomic Layer Deposition Processes with Nanowire-Assisted TEM Analysis
Johann Michler, Ivo Utke, Xavier Maeder
Atomic layer deposition (ALD) is one of the premier methods to synthesize ultra-thin materials on complex surfaces. The technique allows for precise control of the thickness down to single atomic layers, while at the same time providing uniform coverage ev ...
Hoboken2024Piezoelectric and elastic properties of Al0.60Sc0.40N thin films deposited on patterned metal electrodes
Luis Guillermo Villanueva Torrijo, Silvan Stettler, Marco Liffredo, Nan Xu, Federico Peretti
Sc-doped aluminum nitride (AlScN) allows for piezoelectric devices with large electromechanical coupling and the benefits increase with larger Sc doping in the film. However, with a larger Sc concentration, the process window narrows, and it is necessary t ...
2024Advancing high-throughput combinatorial aging studies of hybrid perovskite thin films via precise automated characterization methods and machine learning assisted analysis
Christian Michael Wolff, Austin George Kuba, Alexander Wieczorek
To optimize material stability, automated high-throughput workflows are of increasing interest. However, many of those workflows either employ synthesis techniques not suitable for large-area depositions or are carried out in ambient conditions, which limi ...
Cambridge2024Towards Scalable Electronics: Synthetic 2D Materials for Large-Area 2D Circuit Integration
In the past decades, a significant increase of the transistor density on a chip has led to exponential growth in computational power driven by Moore's law. To overcome the bottleneck of traditional von-Neumann architecture in computational efficiency, effo ...
EPFL2024Direct high-temperature growth of GaN on Si using trimethylaluminum preflow enabling vertically-conducting heterostructures
Elison de Nazareth Matioli, Alessandro Floriduz
In this work, we demonstrate that GaN can be directly grown at high temperature on Si(111) substrates by metalorganic CVD without using any intentional AlN buffer, by simply employing a trimethylaluminum (TMAl) preflow. We found that n-GaN layers directly ...
Iop Publishing Ltd2024Plasmoid drift and first wall heat deposition during ITER H-mode dual-SPIs in JOREK simulations
The heat flux mitigation during the thermal quench (TQ) by the shattered pellet injection (SPI) is one of the major elements of disruption mitigation strategy for ITER. It's efficiency greatly depends on the SPI and the target plasma parameters, and is ult ...
Iop Publishing Ltd2024Colloidal Atomic Layer Deposition on Nanocrystals Using Ligand-Modified Precursors
Raffaella Buonsanti, Anna Loiudice, Krishna Kumar, Ona Segura Lecina, Petru Pasquale Albertini, Philippe Benjamin Green, Coline Marie Agathe Boulanger, Jari Leemans, Mark Adrian Newton
Atomic layer deposition (ALD) is a method to grow thin metal oxide layers on a variety of materials for applications spanning from electronics to catalysis. Extending ALD to colloidally stable nanocrystals promises to combine the benefits of thin metal oxi ...
Amer Chemical Soc2024Scanning Tunneling Microscopy for Molecules: Effects of Electron Propagation into Vacuum
Using scanning tunneling microscopy (STM), we experimentally and theoretically investigate isolated platinum phthalocyanine (PtPc) molecules adsorbed on an atomically thin NaCl(100) film vapor deposited on Au(111). We obtain good agreement between theory a ...
Amer Chemical Soc2024Influence of Ventilation on Formation and Growth of 1-20 nm Particles via Ozone-Human Chemistry
Dusan Licina, Shen Yang, Marouane Merizak, Meixia Zhang
Ozone reaction with human surfaces is an important source of ultrafine particles indoors. However, 1-20 nm particles generated from ozone-human chemistry, which mark the first step of particle formation and growth, remain understudied. Ventilation and indo ...
Washington2024Font Side Solutions for c-Si Solar Cells with High-Temperature Passivating Contacts
In this work, we studied the potential of using thin films deposited by plasma-enhanced chemical vapor deposition (PECVD) for two main purposes: introducing an n-type passivating contact at the front of a TOPCon solar cell, or simplifying the fabrication o ...
EPFL2024