Related publications (254)

Etching selectivity and passivity of Al2O3 layers

Anil Can Kahraman

The project focuses on etching properties of the atomic layer deposition (ALD) of Al2O3. For this purpose, etching processes such as plasma etch with sulfur hexafluoride (SF6), gas etch with xenon difluoride (XeF2), wet etch with MIF developer (726 MIF) as ...
2023

Annealing and Etching Processes for Hafnium Carbide MEMS

Nicolas Andres Avellan Marin

HfC has been very under-investigated due to its rarity and synthesising difficulty. Its potential for MEMS and NEMS applications has been recognized and is the object of an ongoing feasibility study for production since 2022. We continue on this impulse by ...
2023

Demonstrating and Unraveling a Controlled Nanometer-Scale Expansion of the Vacancy Defects in Graphene by CO2

Kumar Varoon Agrawal, Kuang-Jung Hsu, Luis Francisco Villalobos Vazquez de la Parra

A controlled manipulation of graphene edges and vacancies is desired for molecular separation, sensing and electronics applications. Unfortunately, available etching methods always lead to vacancy nucleation making it challenging to control etching. Herein ...
WILEY-V C H VERLAG GMBH2022

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