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We present an automation technique for the growth of electron beam deposited tips on whole wafers of atomic force microscope cantilevers. This technique uses pattern recognition on scanning electron microscope images of successive magnifications to precise ...
Photoresist-based lithography has major limitations when applied to micro-electro-mechanical systems (MEMS) with mechanically fragile and/or chemically functionalised surfaces. As a remedy, alternative, complementary nanopatterning methods have been develo ...
Carbon nanotubes are novel materials with unique electrical and mechanical properties. Here we present results on their atomic structure and mechanical properties in the adsorbed state, on ways to manipulate individual nanotubes, on their electrical proper ...
A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes a ...
This paper presents a microrobot concept for microhandling and micromanipulation, which has been developed within the framework of the EU founded project MiCRoN. The concept is explained along with some examples of realized modules for the robots and a num ...
Lithography on (100) single-crystal silicon and amorphous silicon is performed by electric-field-enhanced local oxidation of silicon using an atomic force microscope (AFM). Amorphous silicon is used as a negative resist to pattern silicon oxide, silicon ni ...
The capability of atomic-force microscopy (AFM) to localize both individual adsorbates and aggregates of adsorbed molecules was demonstrated a few years ago. More recently submonolayers of fullerene molecules deposited on a gold Substrate have been imaged ...
