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Microstereolithography is a new microfabrication process that evolved from the rapid prototyping industry. The first developments in this technology started in 1993 and different research teams around the world have developed microstereolithography machine ...
Fused silica microlenses with low numerical apertures (NAs) were fabricated. The original photoresist element was realized by the melting resist technology and was transferred into fused silica by reactive ion etching. Low selectivity etching was applied t ...
We have developed a micromachined flow cell consisting of a flow channel integrated with micropipettes. The flow cell is used in combination with an optical trap setup (optical tweezers) to study mechanical and structural properties of -DNA molecules. The ...
We present oblique powder blasting as a three-dimensional micromachining technology for brittle materials. Powder blasting is a microfabrication process, based on the use of a pressurised air beam containing eroding Al2O3 particles. By varying the angle of ...
We describe the microfabrication and use of elastomeric and rigid two-level microfluidic networks (μFNs), made of poly(dimethylsiloxane) (PDMS) or Si, for patterning surfaces. The first level corresponds to microchannels and the second to via holes through ...
The flexibility of the new available Inductively Coupled Plasma (ICP) reactors provides a lot of possibilities for process development in dry etching field. Deep anisotropic etching of silicon is now possible under control (etch rate, profiles, uniformity) ...
A new, versatile architecture is presented for microfluidic devices made entirely from glass, for use with reagents which would prove highly corrosive for silicon. Chips consist of three layers of glass wafers bonded together by fusion bonding. On the insi ...
This paper describes a method of thin film and MEMS processing which uses self-assembled monolayers as ultra-thin organic surface coating to enable a simple removal of microfabricated devices off the surface without wet chemical etching. A 1.5-nm thick sel ...
This thesis deals with the development of microfabrication technologies based on photoplastic structuring by lithographic and molding techniques. These technologies, combined with an original releasing method, allow for the simple fabrication of pseudo thr ...
We report on results of the fabrication and the micro-reflectance measurement of GaN photonic crystals. The etching performance of GaN has been studied with a conventional reactive ion etching system and SiCl4 plasma. We obtained an etch rate of 100 nm/min ...
