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This lecture covers the fundamentals and applications of Scanning Probe Lithography (SPL), focusing on surface modification and patterning at the nanometer scale. It explores the variations of SPL, including mechanical, thermal, chemical, and electrical methods. The exposure of resist by Atomic Force Microscopy (AFM) and its advantages over Electron Beam Lithography (EBL) are discussed. Additionally, the lecture delves into topics such as local field enhanced oxidation, Dip-Pen Nanolithography (DPN), nanoscale dispensers, and the influence of surface wettability on nanoscale droplet behavior.