Lithography: Resist Properties and Exposure Methods

In course

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Description

This lecture covers the general concepts of lithography, including resist coating, surface cleaning, resist adhesion, and exposure methods such as optical lithography, electron beam lithography, X-ray lithography, and ion beam lithography. It also discusses resist properties like resist thickness, resist tones, contrast, and pattern transfer techniques.

In MOOCs (3)

Instructors (2)

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Official source

https://mediaspace.epfl.ch/media/0_5vfmy7zb

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