Thin-Film Processing: Deposition Techniques

This lecture covers thin-film processing techniques, including chemical and physical processes for deposition. It explains the advantages of chemical vapor deposition (CVD) over physical vapor deposition (PVD), and introduces growth modes in thin films. The lecture also delves into Atomic Layer Deposition (ALD) as a controlled method for thin film formation. Examples of chemical reactions used in CVD are provided, along with a case study on LP-CVD ZnO. The role of plasma in the process, plasma properties, and the initiation of a plasma discharge are discussed, along with the distinction between thermal and non-thermal plasma. The lecture concludes with an explanation of the Paschen law and the factors influencing the ignition of a plasma discharge.