Thin-Film Processing: Plasma Deposition

This lecture covers the process of plasma-enhanced chemical vapor deposition (PE-CVD) for thin-film processing, focusing on reactions in the plasma, floating surfaces, reactor design, film growth, surface chemistry, and film structure control. It also discusses the interactions between plasma and growing films, the goal of achieving high-quality materials, challenges in PE-CVD, and alternative techniques like physical vapor deposition (PVD) and sputtering. The lecture emphasizes the importance of understanding plasma formation, PE-CVD principles, sheath formations, and the impact of deposition parameters on film properties.