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This lecture covers the fundamentals of thin-film processing, focusing on the deposition techniques, growth modes, and advantages of thin films over bulk materials. It explores various thin-film deposition methods such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD), highlighting their advantages and applications in different industries. The lecture also delves into the role of plasma in the deposition process, discussing the interactions between plasma and growing films. Additionally, it touches upon the challenges and advancements in achieving high-quality thin films through techniques like PE-CVD and sputtering.