Publications by Alan Howling | EPFL Graph Search

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Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges

Electromagnetic sources of nonuniformity in large area capacitive reactors

Fast equilibration of silane/hydrogen plasmas in large area RF capacitive reactors monitored by optical emission spectroscopy

Optimization of the microcrystalline silicon deposition efficiency

Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization

Plasma diagnostics as a tool for process optimization: the case of microcrystalline silicon deposition

Electromagnetic field nonuniformities in large area, high-frequency capacitive plasma reactors, including electrode asymmetry effects

Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity

Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors

Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: The telegraph effect