Feature size effects in chemically assisted ion beam etching of InP-based photonic crystals
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Feature size dependence in Ar/Cl2 chemically assisted ion beam etching of InP-based photonic crystals (PhCs) and its influence on the optical properties of PhC devices operating in the band gap are investigated. The analysis of the measured quality factors ...
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Ieee Service Center, 445 Hoes Lane, Po Box 1331, Piscataway, Nj 08855-1331 Usa2009
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The authors address feature-size dependence in Ar/Cl2 chemically assisted ion beam etching (CAIBE) in the context of the fabrication of photonic crystal (PhC) structures. They systematically investigate the influence of various parameters such a ...
