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The tribological behavior of carbon based thin films is strongly influenced by their chemical composition, polycrystalline structure and surface morphology. We present friction measurements on laser deposited amorphous carbon and carbon nitride (CNchi) thi ...
Zinc oxide (ZnO) is a material that belongs to the family of Transparent Conductives Oxides (TCO). Its non-toxicity and the abundant availability in the Earth's crust of its components make it an ideal candidate as electrical transparent contact for thin-f ...
Designing plasma-enhanced chemical vapour deposition (PECVD) reactors to coat large-area glass plates (similar to1 m(2)) for flat panel display or solar cell manufacturing raises challenging issues in physics and chemistry as well as mechanical, thermal, a ...
When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to the formation of powder, a new type of material, called hydrogenated polymorphous silicon (pm-Si:H) is obtained. This material has increased tran ...
In this work, a low-temperature thick-film dielectric consisting of a high-lead low-temperature glass with a reactive nanoscale filler is characterised to enable deposition of thick-film electronics onto substrates such as glass and metals (steel, aluminiu ...
Effective transverse piezoelectric coefficient e(31,f) has been measured on (100)/(001) sol-gel Pb(ZrXTi1-X) thin films with compositions between 30% and 45% Zr. A maximum value of 8.07 +/- 0.36 C/m(2) at 40% Zr is found. The influence of the poling field ...
To deposit cryolite thin films with a composition close to the correct stoichiometry on a silicon substrate, a Direst Pulsed Laser Deposition (DPLD) set-up and a Crossed Beam Pulsed Laser Deposition (CBPLD) set-up have been used. In the case of CBPLD two t ...
The advantages and limitations of photovoltaic solar modules for energy generation are reviewed with their operation principles and physical efficiency limits. Although the main materials currently used or investigated and the associated fabrication techno ...
When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to that of the formation of powder, a new type of material, named polymorphous silicon (pm-Si:H) is obtained. pmSi:H exhibits enhanced transport pro ...
When silicon thin films are deposited by plasma enhanced chemical vapour deposition in a plasma regime close to that of the formation of powder, a new type of material, called polymorphous silicon (pm-Si), is obtained. We present here the optoelectronic an ...
