In this paper, we report on the properties of GaN films and AlGaN/GaN HEMT structures grown by molecular beam epitaxy on resistive Si(111) substrates. The properties of the GaN buffer layer and the AlGaN/GaN HEMTs are presented. Finally, both static and high frequency performances of submicron gate length devices are analysed demonstrating their RF power capability.
Anna Fontcuberta i Morral, Andrea Giunto, Thomas Hagger, Louise Emma Webb
Hatice Altug, Liza Carol Andrea Dunbar, Dordaneh Etezadi, Cenk Ibrahim Özdemir