Flow process chartThe flow process chart is a graphical and symbolic representation of the activities performed on the work piece during the operation in industrial engineering. The first structured method for documenting process flow, e.g., in flow shop scheduling, the flow process chart, was introduced by Frank and Lillian Gilbreth to members of ASME in 1921 as the presentation "Process Charts, First Steps in Finding the One Best Way to Do Work". The Gilbreths' tools quickly found their way into industrial engineering curricula.
Interference lithographyInterference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.
Control-flow diagramA control-flow diagram (CFD) is a diagram to describe the control flow of a business process, process or review. Control-flow diagrams were developed in the 1950s, and are widely used in multiple engineering disciplines. They are one of the classic business process modeling methodologies, along with flow charts, drakon-charts, data flow diagrams, functional flow block diagram, Gantt charts, PERT diagrams, and IDEF. A control-flow diagram can consist of a subdivision to show sequential steps, with if-then-else conditions, repetition, and/or case conditions.
PhotolithographyIn integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.
Flow diagramFlow diagram is a collective term for a diagram representing a flow or set of dynamic relationships in a system. The term flow diagram is also used as a synonym for flowchart, and sometimes as a counterpart of the flowchart. Flow diagrams are used to structure and order a complex system, or to reveal the underlying structure of the elements and their interaction. The term flow diagram is used in theory and practice in different meanings. Most commonly the flow chart and flow diagram are used in an interchangeable way in the meaning of a representation of a process.
Thin filmA thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering.
Extreme ultraviolet lithographyExtreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma (Sn ions in the ionic states from Sn IX to Sn XIV give photon emission spectral peaks around 13.5 nm from 4p64dn - 4p54dn+1 + 4dn-14f ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist.
Data-flow diagramA data-flow diagram is a way of representing a flow of data through a process or a system (usually an information system). The DFD also provides information about the outputs and inputs of each entity and the process itself. A data-flow diagram has no control flowthere are no decision rules and no loops. Specific operations based on the data can be represented by a flowchart. There are several notations for displaying data-flow diagrams. The notation presented above was described in 1979 by Tom DeMarco as part of structured analysis.
Plasma etchingPlasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma.
Nanoimprint lithographyNanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
