Polymer multilayer photonic micro- and nanostructures with tailored spectral properties
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The endeavour to develop nanodevices demands for patterning methods in the nanometer scale. The continuous improvement in lithography methods based on deep UV (DUV), X-ray, or electron beam exposure allow for further progress in integrated circuit hardware ...
X-ray waveguides offer a novel approach for nanobeam production, which may become useful in coherent beam imaging and phase contrast projection microscopy. Internal field enhancement, coherency properties, and coupling efficiency of these devices have been ...
We present a microspectrometer based on a tunable interference filter for infrared or visible light that scans the desired part of the spectrum within milliseconds. A single pixel detector measures serially the intensity at selected wavelengths. This conce ...
The internal reflection of an excited X-ray waveguide mode in a synthetic nanostructure, defined by electron-beam lithography, has been measured. In this device, the X-ray beam is first coupled into a conventional vertical thin-film waveguide structure and ...
An optically-active multi-layer dielectric structure comprises an optically active zone between two mirrors forming a Fabry-Perot microcavity. The optically active zone comprises an optically active material of wavelength lambda centred in a layer of high ...
GLAZING Field of the invention The present invention relates to glazings which, in particular, may be used in solar collectors. In the present text, the term "glazing" means any material, e.g. glass or polycarbonate, transparent to visible electromagnetic ...
Field of the invention The present invention relates to glazings which, in particular, may be used in solar collectors. In the present text, the term "glazing" means any material, e.g. glass or polycarbonate, transparent to visible electromagnetic radiatio ...
This paper describes Si-micromachined two-axis beam- steering micromirrors and their performance in 256 x 256- and 1024 x 1024-port large optical cross-connects (OXCs). The high-reflectivity wavelength-independent mirrors are electrostatically actuated; ca ...
Undoped fluoride glass slides have been exposed to pulsed 193-nm ultraviolet (UV) irradiation. Their absorption changes have been measured to evaluate UV-induced index changes using Kramers-Kronig relation. A layer-peeling polishing technique was applied t ...
Photoresist-based lithography has major limitations when applied to micro-electro-mechanical systems (MEMS) with mechanically fragile and/or chemically functionalised surfaces. As a remedy, alternative, complementary nanopatterning methods have been develo ...