Electron-beam lithographyElectron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
Near and far fieldThe near field and far field are regions of the electromagnetic (EM) field around an object, such as a transmitting antenna, or the result of radiation scattering off an object. Non-radiative near-field behaviors dominate close to the antenna or scattering object, while electromagnetic radiation far-field behaviors dominate at greater distances. Far-field E (electric) and B (magnetic) field strength decreases as the distance from the source increases, resulting in an inverse-square law for the radiated power intensity of electromagnetic radiation.
Plasma oscillationPlasma oscillations, also known as Langmuir waves (after Irving Langmuir), are rapid oscillations of the electron density in conducting media such as plasmas or metals in the ultraviolet region. The oscillations can be described as an instability in the dielectric function of a free electron gas. The frequency depends only weakly on the wavelength of the oscillation. The quasiparticle resulting from the quantization of these oscillations is the plasmon. Langmuir waves were discovered by American physicists Irving Langmuir and Lewi Tonks in the 1920s.
Radio propagationRadio propagation is the behavior of radio waves as they travel, or are propagated, from one point to another in vacuum, or into various parts of the atmosphere. As a form of electromagnetic radiation, like light waves, radio waves are affected by the phenomena of reflection, refraction, diffraction, absorption, polarization, and scattering. Understanding the effects of varying conditions on radio propagation has many practical applications, from choosing frequencies for amateur radio communications, international shortwave broadcasters, to designing reliable mobile telephone systems, to radio navigation, to operation of radar systems.
Direct image with compact supportIn mathematics, the direct image with compact (or proper) support is an for sheaves that extends the compactly supported global sections functor to the relative setting. It is one of Grothendieck's six operations. Let f: X → Y be a continuous mapping of locally compact Hausdorff topological spaces, and let Sh(–) denote the of sheaves of abelian groups on a topological space. The direct image with compact (or proper) support is the functor f!: Sh(X) → Sh(Y) that sends a sheaf F on X to the sheaf f!(F) given by the formula f!(F)(U) := {s ∈ F(f −1(U)) | f|supp(s): supp(s) → U is proper} for every open subset U of Y.
Thin-film solar cellThin-film solar cells are made by depositing one or more thin layers (thin films or TFs) of photovoltaic material onto a substrate, such as glass, plastic or metal. Thin-film solar cells are typically a few nanometers (nm) to a few microns (μm) thick–much thinner than the wafers used in conventional crystalline silicon (c-Si) based solar cells, which can be up to 200 μm thick. Thin-film solar cells are commercially used in several technologies, including cadmium telluride (CdTe), copper indium gallium diselenide (CIGS), and amorphous thin-film silicon (a-Si, TF-Si).
Colloidal goldColloidal gold is a sol or colloidal suspension of nanoparticles of gold in a fluid, usually water. The colloid is coloured usually either wine red (for spherical particles less than 100 nm) or blue-purple (for larger spherical particles or nanorods). Due to their optical, electronic, and molecular-recognition properties, gold nanoparticles are the subject of substantial research, with many potential or promised applications in a wide variety of areas, including electron microscopy, electronics, nanotechnology, materials science, and biomedicine.
Interference lithographyInterference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.
Propagation constantThe propagation constant of a sinusoidal electromagnetic wave is a measure of the change undergone by the amplitude and phase of the wave as it propagates in a given direction. The quantity being measured can be the voltage, the current in a circuit, or a field vector such as electric field strength or flux density. The propagation constant itself measures the change per unit length, but it is otherwise dimensionless. In the context of two-port networks and their cascades, propagation constant measures the change undergone by the source quantity as it propagates from one port to the next.
PhotolithographyIn integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.
