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Plasma Spray-CVD: A New Thermal Spray Process to Produce Thin Films from Liquid or Gaseous Precursors

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High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Michael Oliver Reinke

Thin films of oxide materials are widely used for various types of applications. The selection of an appropriate deposition method depends on the aimed material and application. We review here a high vacuum chemical vapour deposition (HV-CVD) method, which ...

Elsevier2013

Electrospray Ion Beam Deposition of Complex Non-Volatile Molecules

Gordon Rinke

The rational synthesis of novel materials requires the control over the arrangement of matter in order to meet the desired properties for applications and devices. Ultimately, control means to define the place of each atom and determine its chemical state, ...

EPFL2013

Thermal Boundary Conductance between metals and dielectrics

Christian Monachon

This work consists in an experimental study of the main parameters governing the transport of heat across an interface between two solids, when it is dominated by phonons. The main experimental tool used is Time-Domain ThermoReflectance (TDTR), which is an ...

EPFL2013

Formation of cubic structured (Al1-xCrx)(2+delta)O-3 and its dynamic transition to corundum phase during cathodic arc evaporation

Alireza Karimi, Hossein Najafi

Mixed aluminum-chromium oxide coatings in the form of (Al,Cr)(2)O-3 solid solutions have attracted extensive research interest during the past years due to their successful use for challenging wear applications and the comparative ease of their moderate-te ...

Elsevier Science Sa2013

We report a positive exchange bias in thin film multilayers produced with nano-oxide layer. The positive exchange bias resulted from an antiferromagnetic interfacial exchange coupling between the ferromagnetic CoFe and the antiferromagnetic CoO layers, whi ...

Amer Inst Physics2013

Formation Mechanisms and Structural Properties of Aluminium-Chromium Based Oxynitride Thin Films Synthesized by Physical Vapor Deposition

Hossein Najafi

Oxynitride thin films, a novel class of mixed anionic solid structures, have gained an intense interest during recent years related to the unique interplay of oxygen (O) and nitrogen (N) with metals in the material structure. This matter can result in spec ...

EPFL2012

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To further lower production costs and increase conversion efficiency of thin-film silicon solar modules, challenges are the deposition of high-quality microcrystalline silicon (μc-Si:H) at an increased rate and on textured substrates that guarantee efficie ...

2012

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

Christoph Hollenstein, Alan Howling, Boris Legradic, Michaël Chesaux

The interplay of gas flow and depletion by plasma dissociation determines the spatial distribution of species and the deposition uniformity in a plasma source. Many plasma reactors use a gas showerhead and the design of the flow dynamics is a critical aspe ...

2012

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Conventional equipment for plasma spraying can be adapted for operation at low pressure so that PECVD-like processing can be performed. The plasma jet generated by the torch is characterized by a high convective velocity and a high gas temperature. The inf ...

Springer US2012

Nowadays thin films play an important role in everyday life and in industries. Thin film technology has been developed primarily for the growing demand for development of smaller and smaller devices that require advanced materials and new processing techni ...

EPFL2011