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Conductivity of SU-8 Thin Films through Atomic Force Microscopy Nano-Patterning

Related publications (49)

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Thermomechanical nanocutting of 2D materials using thermal scanning probe lithography

Jürgen Brugger, Giovanni Boero, Xia Liu, Ana Conde Rubio, Samuel Tobias Howell

The rapidly evolving field of 2D materials has developed a plethora of emerging micro/nano devices where atomically-thin materials play a fundamental role. In most cases, this implies the need of nanostructuring them, but due to their delicate nature, conv ...

2020

Thermal scanning probe lithography-a review

Jürgen Brugger, Samuel Tobias Howell

Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in appl ...

2020

Thermal scanning probe lithography (t-SPL) is an advanced lithography technique in which a heated atomic force microscope tip locally modifies a sample material. Due to the nanometer-sized tip apex diameter, t-SPL enables patterning of sub-10 nm structures ...

EPFL2018

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The fabrication of high-performance solid-state silicon quantum-devices requires high resolution patterning with minimal substrate damage. We have fabricated room temperature (RT) single-electron transistors (SETs) based on point-contact tunnel junctions u ...

2018

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

Jürgen Brugger, Yuliya Lisunova

Thermal scanning probe lithography is an emerging nanofabrication technique for rapid prototyping of arbitrary topographies in thermally sensitive resist. This feature, paired to the recent advances in dry plasma etching techniques, allows the fabrication ...

Elsevier2017

Thermal scanning probe lithography is a novel lithographic method that allows to create three dimension pattern with high precision at the micro and nano scale. In this project, the impact of two important parameters (the distance be- tween the tip and the ...

2016

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The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithography (NIL) is addressed in this work. Thermal shrinkage is induced by cooling the structures below room temperature to avoid the issues commonly arising du ...

Springer Verlag2014

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Cristina Martin Olmos, Oscar Vazquez Mena, Katrin Sidler Arnet

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

MDPI2013

Low-NA focused vortex beam lithography for below 100-nm feature size at 405 nm illumination

Hans Peter Herzig, Toralf Scharf, Myun Sik Kim

There are varieties of novel methods, which demonstrate the super-resolution. For instance, an optically trapped sub-micron dielectric sphere serves as a near-field focusing lens to directly write patterns of ~100 nm in liquid, and accelerated metallic nan ...

Spie-Int Soc Optical Engineering2013

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In this paper, we demonstrate a novel method for high throughput patterning of bioprobes with nanoscale features on biocompatible polymer substrate. Our technique, based on nanostencil lithography, employs high resolution and robust masks integrated with a ...

2012