High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection
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Light Induced Chemical Vapour Deposition (LICVD) of titanium dioxide thin films is studied in this work. It is shown that this technique enables to deposit locally and selectively a chosen crystalline phase with a precise controlled thickness at low substr ...
The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than the mean free path of the molecules determined by the pressure ...
ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (ECOL-Non-standard) BENVENUTI G (BENV-Individual) AMOROSI S (AMOR-Individual) HALARY-WAGNER E (HALA-Individual)2002
A method for the gas phase deposition of partially fluorinated or perfluorinated alkyl silanes onto a substrate in a reaction chamber includes cleaning the substrate, hydrating the substrate with steam, drying the substrate and silanization of the substrat ...
SWISSOPTIC AG (SWIS-Non-standard) ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (ECOL-Non-standard)2002
Titanium dioxide (TiO2) is a widely investigated material for its biological compatibility, high dielectric constant and refractive index, chemical and mechanical resistance, and catalytic activity. Several different techniques are available to produce TiO ...
Firsts results on particle detection using a novel silicon pixel detector are presented. The sensor consists of an array of 48 square pixels with 380 μm pitch based on a n-i-p hydrogenated amorphous silicon (a-Si:H) film deposited on top of a VLSI chip. Th ...
AIN is a material used in a wide variety of applications such as electroacoustic devices, blue diodes, IR windows, thermal conductors, metal-insulator-semiconductor structures, integrated circuit packaging, etc. In this work thin piezoelectric AIN polycrys ...
Two methods were used for the deposition of Pt particles on synthetic B-doped diamond (BDD) surfaces: chem. deposition and electrodeposition under potentiostatic conditions. However, electrodeposition leads much higher Pt dispersion than chem. deposition. ...
In the present work, several series with variation of deposition parameters such as hydrogen dilution ratio, VHF-power and plasma excitation frequency fexc have been extensively analyzed. Compared with `conventional' more-stable layers obtained at 200-250 ...
We report here on ferromagnetic/superconductor FM/SC and SC/FM double layers deposited without a buffer layer between FM and SC. Thin films of La0.7Sr0.3MnO3 (LSMO) are used for the FM, and YBa2Cu3O7-x (YBCO) for the SC. Both films can grow crystalline on ...
Designing plasma-enhanced chemical vapour deposition (PECVD) reactors to coat large-area glass plates (similar to1 m(2)) for flat panel display or solar cell manufacturing raises challenging issues in physics and chemistry as well as mechanical, thermal, a ...