High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection
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The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than the mean free path of the molecules determined by the pressure ...
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SWISSOPTIC AG (SWIS-Non-standard) ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (ECOL-Non-standard)2002
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