Electropolymerisation dynamics of a highly conducting metallopolymer: poly-[Os(4'-(5-(2,2'-bithienyl))-2,2':6',2''-terpyridine)2]2+
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Focused Electron Beam Induced Deposition (FEBID) is a rapid prototyping technique for the investigation, production and modification of 2 and 3-D nanostructures. The process takes place at room temperature, in the high-vacuum chamber of a Scanning Electron ...
This thesis work focuses on impact and diffusion processes as well as equilibrium positions of a metal deposited on a surface. The metal is deposited in the form of clusters containing n atoms in a controlled way. Gold or silver clusters cations (Au+n and ...
Light Induced Chemical Vapour Deposition (LICVD) of titanium dioxide thin films is studied in this work. It is shown that this technique enables to deposit locally and selectively a chosen crystalline phase with a precise controlled thickness at low substr ...
The method for group manufacturing of pyroelectric sensors by forming a thin pyroelectric layer on the upper side of a silicon wafer, where each sensor comprises several pixels (4) and each pixel is defined by an upper electrode (6) situated on the face si ...
The deposition of particles and substances in air is under strong influence of the precipitation patterns of the atmosphere. Most multimedia models, like type III Mackay models, treat rain as a continuous phenomenon. This may cause severe overestimation of ...
Understanding the growth mechanism in molecular organic thin films is fundamental to their applications in organic electronics. We present an extensive study of the growth mechanism of pentacene thin films on silicon dioxide (SiO2) using atomic ...
The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than the mean free path of the molecules determined by the pressure ...
The growth dynamics of oxygen assisted focused electron beam induced deposition of Si-containing materials (from SiOxCy to SiO2) were investigated as a function of relevant process parameters. The results obtained from organosilanes of different families ( ...
Large area plasma-enhanced chemical vapor deposition of thin films such as silicon nitride or amorphous silicon is widely used for thin film transistor fabrication in the flat panel display industry. A numerical three-dimensional model to calculate the dep ...
A numerical two dimensional model to calculate the deposition uniformity over the whole electrode surface in large area rectangular plasma enhanced chemical vapour deposition reactors is presented. In this model, the three dimensional mass and species cont ...
