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Morphological Characterization of ALD and Doping Effects on Mesoporous SnO2 Aerogels by XPS and Quantitative SEM Image Analysis

Related publications (53)

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Niobium nitride based thin films deposited by DC reactive magnetron sputtering

Due to their high hardness, high melting point and high chemical stability, transition metal nitrides present a great interest for various applications. This work constitutes a contribution to the understanding of the properties of Nb based binary and tern ...

EPFL2005

Titanium aluminium nitride (TiAlN)-based coatings are designed specially for applications where oxidation and wear resistance are primary demands, as in the case of cutting tools. Moreover the coatings are required to be thermally stable as well as have go ...

EPFL2004

Direct observation of toughening mechanisms in carbon nanotube ceramic matrix composites

William Curtin, Ho Ling Li

The excellent mechanical properties of carbon nanotubes (CNTS) are driving research into the creation of new strong, tough nanocomposite systems. Here, the first evidence of toughening mechanisms operating in carbon-nanotube-reinforced ceramic composites i ...

2004

Chemical beam deposition of titanium dioxide thin films

Giacomo Benvenuti

Titanium dioxide (TiO2) is a widely investigated material for its biological compatibility, high dielectric constant and refractive index, chemical and mechanical resistance, and catalytic activity. Several different techniques are available to produce TiO ...

EPFL2003

Uniaxial fragmentation tests were carried out in situ in a scanning electron microscope (SEM) on 10-nm-thick silicon oxide coatings deposited by plasma enhanced chemical vapor deposition on poly(ethylene terephthalate). In order to prevent charging effects ...

2003

The present work analyses silicon oxide coated polyester films, with attention paid to the effect of substrate process additives on the coating defect population, and on the coated film mechanical properties. The defect population is characterized by means ...

2003

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In this work, a low-temperature thick-film dielectric consisting of a high-lead low-temperature glass with a reactive nanoscale filler is characterised to enable deposition of thick-film electronics onto substrates such as glass and metals (steel, aluminiu ...

2003

Intermetallic thin films of stoichiometric NiAl and Ni3Al have been deposited onto n-type silicon (100) and nickel (110) substrates using r.f.-magnetron co-sputtering. The morphology and crystal structure of the thin films have been studied by transmission ...

2000

Using a first-principles density functional approach, we investigate the chemisorption mechanism for the interaction of spherosiloxane (H8Si8O12) clusters on Si(100). Our transition state studies reveal that the chemisorption pathway with the lowest activa ...

2000

Single crystals of layered semiconductors such as WS2 and MoS2 have already proven their efficiency as active elements in photovoltaic cells. Due to their high optical absorption coefficient in the visible range, these materials could be used in the form o ...

EPFL1998