Publication

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Related publications (49)

About
Privacy
Disclaimer

Graph Chatbot

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Graph Chatbot

Chat with Graph Search

Stability of Fiber Bragg Gratings Fabricated Using UV Ar+ and ArF Excimer in Bismuth-Aluminum-co-Doped Silica Fibers

A High-Efficiency Nonuniform Grating Coupler Realized With 248-nm Optical Lithography

Reusable plasmonic substrates fabricated by interference lithography: a platform for systematic sensing studies

Batch fabrication of gold-gold nanogaps by E-beam lithography and electrochemical deposition

A CMOS-Compatible, Low-Loss, and Low-Crosstalk Silicon Waveguide Crossing

Dose dependence of luminescence increase in H2-loaded Bi-Al co-doped optical fibers by cw 244-nm and pulsed 193-nm laser irradiation

Photosensitivity and Luminescence Induced by ArF-Irradiation of Hydrogen Loaded Bi-SiO2 Fiber

Thermal decay of ArF-excimer-laser fabricated fiber Bragg gratings in Bi-Al-doped optical fibers

Thermal decay of UV Ar+ and ArF excimer laser fabricated Bragg gratings in SMF-28e and Bi-Al-doped optical fiber

Fabrication of Bragg Gratings in Microstructured Bi:SiO2 Optical Fiber Using an ArF Laser