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Spontaneous formation of ordered micro-wrinkles on a thermosensitive resist

Related publications (62)

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Research into mesoscopic magnetic systems, which incorporate magnetic elements with dimensions ranging from a few nm up to a few 10s of micrometer, has been spurred on by the developments in their fabrication, characterisation, and control. Electron beam a ...

2021

Fabrication of plasmonic structures with well-controlled nanometric features: a comparison between lift-off and ion beam etching

Olivier Martin, Christian Santschi, Banafsheh Abasahl

After providing a detailed overview of nanofabrication techniques for plasmonics, we discuss in detail two different approaches for the fabrication of metallic nanostructures based on e-beam lithography. The first approach relies on a negative e-beam resis ...

IOP PUBLISHING LTD2021

Study of Linear Coupling in NEMS

Maxime Pitteloud

Cantilever beams are used as mass sensing device of chemical analyte by measuring the shift in frequency. However there resolution is linked to their size. As it become increasingly hard to produce smaller device an alternative is to use mode localisation ...

2021

Fabrication of piezoelectric electrodes

Demar Künzle

The objective of this semester project is to investigate different fabrication processes and materials used for the fabrication of piezoelectric electrodes. More in detail, to investigate if the use of test wafers and high resistivity wafers play a role on ...

2021

Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniques

Toralf Scharf, Wilfried Noell, Jeremy Béguelin

Tolerancing is an important step toward the fabrication of high-quality and cost-effective lens surfaces. It is critical for wafer-level optics, when up to tens of thousands microlenses are fabricated in parallel and whose surfaces cannot be formed individ ...

OPTICAL SOC AMER2020

Grayscale e-beam lithography: Effects of a delayed development for well-controlled 3D patterning

Henning Paul-Julius Stahlberg

Grayscale electron beam lithography (g-EBL) is a fabrication technique that allows for tunable control of resist topography. In most cases, the height of the structures is in the submicron regime. Here, we present an extensive experimental characterization ...

2020

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For the back-end microfabrication in integrated circuits and for the manufacturing of light emitting diodes, proximity mask-aligner lithography is still the tool of choice, due to its simplicity and low costs. However, the downscaling of functional element ...

IEEE2018

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018

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We present an innovative fabrication method for solid-state nanoporous membranes based on the casting of sacrificial silicon nanostructures. The process allows the individual definition of geometry and placement of each nanopore through e-beam lithography ...

Amer Chemical Soc2017

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Hans Peter Herzig, Toralf Scharf, Qing Tan, David Nguyen, Krishnaparvathy Puthankovilakam

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Spie-Int Soc Optical Engineering2014