Publication

Mechanical characterization of a new high-aspect-ratio near UV-photoresist

Related publications (32)

Angular Dependence of Magnetic Normal Modes in NiFe Antidot Lattices With Different Lattice Symmetry

Dirk Grundler

We report an experimental investigation of the magnetic normal modes in large-area Ni80Fe20 antidot arrays fabricated on commercially available silicon substrates using deep ultraviolet lithography at 248 nm exposing wavelength. The effect of the lattice s ...
Institute of Electrical and Electronics Engineers2010

Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography

Jeffrey Alan Hubbell, Harry Heinzelmann, Raphaël Pugin, Ana Maria Popa

Here we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus ...
2009

Acrylated Hyperbranched Polymer Photoresist for Ultra-Thick and Low-Stress High Aspect Ratio Micropatterns

Yves Leterrier, Lars Schmidt

Different photocurable acrylates, including two hyperbranched monomers, are compared with an epoxy negative-tone photoresist (SU-8) with respect to their suitability for the fabrication of ultra-thick polymer microstructures in a photolithographic process. ...
Institute of Physics2008

Development of novel SU-8 based nanoimprint lithography

Shenqi Xie, Rong Yang

We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion et ...
2008

Polymer multilayer photonic micro- and nanostructures with tailored spectral properties

Amazing and beautiful optical effects are present in Nature. Some examples are the iridescent colors produced by peacocks, butterflies and beetles. While the simulations of some of these structures have already been realized, only a few elements have been ...
Institut de Microtechnique, Université de Neuchâtel2008

Evaluation of two commercial finite element packages for calculating AC losses in 2-D high temperature superconducting strips

Francesco Grilli, Frédéric Sirois, François Roy, Bertrand Dutoit

This paper compares the speed and accuracy of two commercial packages based on the finite element method (FEM) for calculating the AC losses in high temperature superconductors (HTS). The softwares investigated in this paper were COMSOL Multiphysics and FL ...
2008

Ion Beam Etching: Replication of Micro Nano-structured 3D Stencil Masks

Jürgen Brugger, Luis Guillermo Villanueva Torrijo

Ion beam LIGA allows the etching of 3D nano-structures by direct writing with a nano-sized beam. However, this is a relatively time consuming process. We propose here another approach for etching structures on large surfaces and faster, compared to the dir ...
2008

Model for predicting the UHPFRC tensile hardening response

Eugen Brühwiler, Emmanuel Denarié, John Wuest

Ultra High Performances Fibre Reinforced Concretes (UHPFRC) are characterised by an extremely low permeability and outstanding mechanical properties. These characteristics make UHPFRC suitable for locally “harden” reinforced concrete structures subjected t ...
Uni Kassel2008

Improved and new properties of resist materials by doping with nanoparticles and nanocrystals

Jürgen Brugger, Vahid Fakhfouri

Increasing interest in specific applications in the field of micro- and nano-electromechanical systems (MEMS and NEMS) has raised the request for new functional polymeric materials. Epoxy based photoresists are being broadly used for the fabrication of mic ...
2007

Application of Microstencil Lithography on Polymer Surfaces for Microfluidic Systems with Integrated Microelectrodes

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Nao Takano

Microfluidic systems with incorporated microelectrodes are adopted in a variety of applications in life sciences. However, most of micro-electro-fluidic devices are fabricated based on silicon and silicon related materials micromachining processes, which a ...
2006

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