Publication
Powder blasting for three-dimensional microstructuring of glass
Abstract
We report on powder blasting as a promising technology for the three-dimensional structuring of brittle materials. We investigate the basic parameters of this process, which is based on the erosion of a masked substrate by a high-velocity eroding powder beam, using glass substrates. We study the effect of various parameters on the etching rate, like the powder velocity and the mask feature size, which induces geometrical effects to the erosion process. We introduce oblique powder blasting and investigate, in particular, sidewall effects of the micropatterned structures. A few examples of devices micromachined by powder blasting are also presented. Keywords: Sand blasting; Powder blasting; Microfabrication; Erosion; Etching
Official source
About this result
This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.
Ontological neighbourhood
Related concepts (30)
Etching (microfabrication)
Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.
Reactive-ion etching
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber.
Plasma etching
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma.
Related publications (45)
Micromachining of Hafnium Carbide
During this project, the microfabrication of Hafnium Carbide (HfC) was investigated. Multiple tools were considered and tested for their compatibility and effectiveness when working with HfC. The main method of choice for the machining of HfC thin films wa ...
2023Etching selectivity and passivity of Al2O3 layers
The project focuses on etching properties of the atomic layer deposition (ALD) of Al2O3. For this purpose, etching processes such as plasma etch with sulfur hexafluoride (SF6), gas etch with xenon difluoride (XeF2), wet etch with MIF developer (726 MIF) as ...
2023PDC microfabrication through KOH-etched Si mould casting
The purpose of this project is to fabricate a mould etched by KOH for PDC casting and produce the fist PDC using this method. Casting for PDC is a known process, it has been done with PDMS moulds created from Si masters. Si moulds have also been fabricated ...
2021Related MOOCs (8)
Micro and Nanofabrication (MEMS)
Learn the fundamentals of microfabrication and nanofabrication by using the most effective techniques in a cleanroom environment.
Microstructure Fabrication Technologies I
Learn the fundamentals of microfabrication and nanofabrication by using the most effective techniques in a cleanroom environment.
Micro and Nanofabrication (MEMS)
Learn the fundamentals of microfabrication and nanofabrication by using the most effective techniques in a cleanroom environment.