Publication
UV-imprint lithography has attracted attentions since its invention in 1996 together with thermal imprint lithography, which are so-called nanoimprint lithography (NIL). One of the characteristics of UV-imprint lithography is that a polymer layer to be structured is cured by UV exposure, and therefore the stamp for UV-imprint lithography has to be transparent. In order to establish the UV-imprinting process with the newly introduced system in CMI, we evaluated the process with two different photo-sensitive polymers that have different viscosities. Various nanostructures were realized by using both polymers, and their smallest feature is 67 nm. (Structure size depends on a stamp to be used.)
Nico de Rooij, Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos, Peter Van der Wal
Jürgen Brugger, Victor Javier Cadarso Busto, Thomas Kiefer, Vaida Auzelyte
Philippe Renaud, Harald Van Lintel, Shahin Bonakdar, Hanie Kavand