Nanolithography

Summary

Nanolithography (NL) is a growing field of techniques within nanotechnology dealing with the engineering (patterning e.g. etching, depositing, writing, printing etc) of nanometer-scale structures on various materials. The modern term reflects on a design of structures built in range of 10−9 to 10−6 meters, i.e. nanometer scale. Essentially, the field is a derivative of lithography, only covering very small structures. All NL methods can be categorized into four groups: photo lithography, scanning lithography, soft lithography and other miscellaneous techniques. History The NL has evolved from the need to increase the number of sub-micrometer features (e.g. transistors, capacitors etc.) in an integrated circuit in order to keep up with Moore's Law. While lithographic techniques have been around since the late 18th century, none were applied to nanoscale structures until the mid-1950s. With evolution of the semiconductor industry, demand for techniques capable of producing m

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We propose and demonstrate the ability and efficiency of using a universal file format for a nanolithography pattern. A problem faced by the physicists working in the field of nanolithography is a lack of a flexible pattern design software (possibly open–source) that could be applied in combination with a broad range of commercial scanning probe microscope (SPM) systems. The current nanolithography software packages are device–specific and not portable. Therefore, it is impossible to make a lithography pattern and share it with fellow physicists working on a networked sub-system. In this paper we describe the software designed to read and interpret a nanolithography pattern stored in a Windows Metafile (WMF) standard graphic format and next to draw it on a substrate using an SPM tip. The nanolithography parameters like height, velocity, feedback force, etc. are coded in the color of the WMF onto the RGB channels of the image establishing a distinct relation between a graphical feature (color) and the used nanolithography scheme (voltage, height, etc.). The concept enables preparation of complex patterns using any standard graphic software and aids an intuitive recognition of the mode and parameters set for a pattern. The advantages of using a WMF over other approaches and the universal scope of the software are discussed.

2004

Bending properties of two- and three-dimensional-shaped nanoparticles fabricated via substrate conformal imprint lithography

Frank Pilger

Springer Verlag2017

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The challenge of wafer-scale integration of silicon nanowires into microsystems is addressed by developing a fabrication approach that utilizes a combination of Bosch-process-based nanowire fabrication with surface micromachining and chemical-mechanical-polishing-based metal electrode/contact formation. Nanowires up to a length of 50 mu m are achieved while retaining submicron nanowire-to-electrode gaps. The scalability of the technique is demonstrated through using no patterning method other than optical lithography on conventional SOI substrates. Structural integrity of double-clamped nanowires is evaluated through a three-point bending test, where good clamping quality and fracture strengths approaching the theoretical strength of the material are observed. Resulting devices are characterized in resonator and switch applications-two areas of interest for CMOS-compatible solutions-with all-electrical actuation and readout schemes. Improvements and tuning of obtained performance parameters such as resonance frequency, quality factor and pull-in voltage are simply a question of conventional design and process adjustments. Implications of the proposed technique are far-reaching including system-level integration of either single-nanowire devices within thick Si layers or nanowire arrays perpendicular to the plane of the substrate.

Institute of Physics2011