Sputtered silicon carbide thin films as protective coating for MEMS applications
Graph Chatbot
Chat with Graph Search
Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.
DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.
Erbium-doped amorphous aluminum oxide layers deposited on Si or oxidized silicon substrates are promising construction pieces for future monolytic integrated optoelectronics devices. In a novel high-vacuum chemical vapor deposition setup the alumina films ...
This paper reports the impressive mechanical properties of 1 μm thick carbon-containing SiOx gas barrier coatings, characterised using the uniaxial fragmentation test. Such coatings have been found to act as excellent barriers to water vapour permeation pa ...
Multilayered niobium oxynitride films were deposited onto (100) Si using DC magnetron sputtering with a reactive gas pulsing process. The argon and nitrogen flows were kept constant during sputtering of a pure niobium target and the oxygen flow was pulsed ...
Transition metal dichalcogenides (TMD) are widely used as self-lubricating material either as oil additive or directly as thin films. Magnetron sputtering is a deposition method allowing depositing such films with high density and adhesion. However, their ...
The main focus of this work is fuel retention in plasma components of the JET water-cooled Mk-I divertors operated with small tiles, first with carbon fibre composite (CFC) and then with castellated beryllium. Until recently these have been the only large- ...
(001)-textured AIN thin films as needed for longitudinal bulk acoustic wave (BAW) devices exhibit large mechanical stress variations and large orientation variation as a function of growth substrate properties. We prepared thin silicon and silicon dioxide ...
Ieee Service Center, 445 Hoes Lane, Po Box 1331, Piscataway, Nj 08855-1331 Usa2008
Pulse plating of nickel-tungsten alloys has been studied from two citrate ammonia based model electrolytes containing either an excess of nickel or an excess of tungsten. The alloy composition and current efficiency were determined for pulse periods rangin ...
In this paper, the authors present a breakthrough extension of the stencil lithography tool and method. In the standard stencil lithography static mode, material is deposited through apertures in a membrane (stencil) on a substrate which is clamped to the ...
Results are presented for heat loads at the TCV outer divertor target during ELMing H-mode using a fast IR camera. Benefitting from a recent surface cleaning of the entire first wall graphite armour, a comparison of the transient thermal response of freshl ...
Barrier film for encapsulation of oxygen and moisture sensitive devices comprising a base polymer substrate and applied onto the base substrate, a barrier layer comprising an inorganic coating deposited by a vapour deposition method, characterised in that ...
