High-aspect ratio three-dimensional photoresin-based microstructures doped with luminescent nanocrystals
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This thesis describes some of three years'work carried at the Centre Suisse d'Electronique et de Microtechnique (Neuchâtel, Switzerland) under the supervision of Dr. Martha Liley and in collaboration with Prof. Horst Vogel of the Ecole Polytechnique Fédéra ...
A new approach for the realization of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes su ...
A new approach for the realization Of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes su ...
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Characterization of the mechanical and thermal properties of the high aspect- ratio, negative, UV resist, SU-S has been carried out. This resist allows for a broad range of thicknesses to be obtained with a single spin process. Standard exposure with a UV ...
Detailed investigations of the limits of a new negative-tone near-UV resist (IBM SU-8) have been performed. SU-8 is an epoxy-based resist designed specifically for ultrathick, high-aspect-ratio MEMS-type applications. We have demonstrated that with single- ...
