High-aspect ratio three-dimensional photoresin-based microstructures doped with luminescent nanocrystals
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Photoresist-based lithography has major limitations when applied to micro-electro-mechanical systems (MEMS) with mechanically fragile and/or chemically functionalised surfaces. As a remedy, alternative, complementary nanopatterning methods have been develo ...
This thesis describes some of three years'work carried at the Centre Suisse d'Electronique et de Microtechnique (Neuchâtel, Switzerland) under the supervision of Dr. Martha Liley and in collaboration with Prof. Horst Vogel of the Ecole Polytechnique Fédéra ...
The understanding of material self-assembling and self-organization mechanisms, at mesoscale, is crucial for nanotechnologies development. Such structures, hierarchically organized in superlattices or colloïdal crystals, are observed in inorganic or organo ...
Characterization of the mechanical and thermal properties of the high aspect- ratio, negative, UV resist, SU-S has been carried out. This resist allows for a broad range of thicknesses to be obtained with a single spin process. Standard exposure with a UV ...
A new approach for the realization of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes su ...
Over the past fifteen years dye-sensitised nanocrystalline solar cells have been the subject of intense research and development efforts. These systems provide a technically and economically credible alternative to classical p-n junction solar cells, reach ...
A new approach for the realization Of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes su ...
Detailed investigations of the limits of a new negative-tone near-UV resist (IBM SU-8) have been performed. SU-8 is an epoxy-based resist designed specifically for ultrathick, high-aspect-ratio MEMS-type applications. We have demonstrated that with single- ...
A carbon-based interdigitated electrode array (IDA) was fabricated by photolithographic patterning of RF sputtered thin-film carbon layers. The IDAs consisted of 125 pairs having the finger width of 2.5 μm and 1.5 μm gap. The electrochemical behavior of th ...
