Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

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Optimizing Atomic Layer Deposition Processes with Nanowire-Assisted TEM Analysis

Piezoelectric and elastic properties of Al0.60Sc0.40N thin films deposited on patterned metal electrodes

Influence of Ventilation on Formation and Growth of 1-20 nm Particles via Ozone-Human Chemistry

Optimizing Atomic Layer Deposition Processes with Nanowire-Assisted TEM Analysis

Piezoelectric and elastic properties of Al0.60Sc0.40N thin films deposited on patterned metal electrodes

Influence of Ventilation on Formation and Growth of 1-20 nm Particles via Ozone-Human Chemistry