Posez n’importe quelle question sur les cours, conférences, exercices, recherches, actualités, etc. de l’EPFL ou essayez les exemples de questions ci-dessous.
AVERTISSEMENT : Le chatbot Graph n'est pas programmé pour fournir des réponses explicites ou catégoriques à vos questions. Il transforme plutôt vos questions en demandes API qui sont distribuées aux différents services informatiques officiellement administrés par l'EPFL. Son but est uniquement de collecter et de recommander des références pertinentes à des contenus que vous pouvez explorer pour vous aider à répondre à vos questions.
We discuss the potential and limitations of Light-coupling masks for high-resolution subwavelength optical lithography. Using a three-dimensional fully vectorial numerical approach based on Green's tensor technique, the near-field distribution of the elect ...
Light-coupling masks (LCMs) based on structured organic polymers that make conformal contact with a substrate can constitute an amplitude mask for light-based lithographies. The LCM is exposed through its backside, from where the light is differentially gu ...
Increased flexibility in patterning becomes important for the engineering of advanced nano/micro-electro-mechanical systems (NEMS/MEMS). Surfaces to be structured are either mechanically unstable and/or (bio-) chemically functionalized, such as ultra-thin ...
Photoresist-based lithography has major limitations when applied to micro-electro-mechanical systems (MEMS) with mechanically fragile and/or chemically functionalised surfaces. As a remedy, alternative, complementary nanopatterning methods have been develo ...
A novel local illumination scheme for optical lithography is proposed. It is based on the excitation of a surface plasmon on a metal film incorporated into a polymer light coupling mask for contact lithography. The electromagnetic field associated with the ...
Photoresist-based lithography has major limitations if applied to MEMS with mechanically fragile and chemically functionalized surfaces. As remedy, new alternative and complementary nanopatterning methods have been developed, such as thermo-mechanical inde ...
A means of accurate control of the curvature radius of molds that are used in nanostructure replication techniques is presented. The local non-uniform growth of SiO2 at regions with high curvature is used to fabricate molds with a curvature radius ranging ...
For dry toner electrophotographic color printers, we present a numerical simulation model describing the color printer response based on a physical characterization of the different electrophotographic process steps. The proposed model introduces a Cross T ...
Society of Photo-Optical Instrumentation Engineers2001
We have developed a colour prediction model and an ink-spreading model. The present study aims at confirming the validity of both models for the case of ink-jet prints using cyan, magenta and yellow inks. Our colour prediction model, augmented by the ink-j ...