Concept

Stepper

Publications associées (77)

Etching of RuO2 and Pt thin films with ECR/RF reactor

Paul Muralt, Stéphane Hiboux, Nicolas Ledermann

Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical parameters during etching of RuO2 and Pr by a dual frequency ECR/RF reactor have been investigated. The ...

2000

Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor

Nava Setter, Paul Muralt, Enrico Colla, Andreas Seifert, Nicolas Ledermann

Ferroelectric capacitive devices for memory and MEMS applications require patterned ferroelectric thin films with high anisotropic etched features. In this paper, physical and chemical parameters during etching of Pb(Zr0.53Ti0.47)O-3 (PZT) by a dual freque ...

2000

Etching of platinum thin films with dual frequency ECR/RF reactor

Paul Muralt, Nicolas Ledermann

Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical mechanisms during platinum etching by a dual frequency ECR/RF reactor have been investigated. An ion be ...

1999

Inhomogeneous and thickness-dependent chemical reactivity at GaSe-Si interfaces

Giorgio Margaritondo, Helmuth Berger

Scanning photoelectron spectromicroscopy experiments on the edge of patterned Si overlayers on GaSe revealed the presence of an inhomogeneous reaction with a metallic-like Ga phase separation. The Si-Se chemically shifted components show lateral variations ...

1999

A multi-layer process for the fabrication of HTSC flux transformers and SQUIDS

Dirk Grundler

A multi-layer technology, based on YBaCuO as the superconducting material and SrTiO3 as the insulating material, is described. Patterning is performed by photolithography and Ar-ion-beam etching under fiat incidence. Using a resist bake-out prior to the et ...

1994

Silicon-Based Chlorine Sensor with On-Wafer Deposited Chemically Anchored Diffusion Membrane

Nico de Rooij, Albert van den Berg

A method for on-wafer fabrication of free-chlorine sensors is described. The sensor structure consists of a planar three-electrode electrochemical cell covered with a poly(hydroxyethyl methacrylate) hydrogel membrane. This membrane is photolithographically ...

1992

High-power modular LED-based illumination systems for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

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