Concept

Masque photographique

Publications associées (98)

Etching of platinum thin films with dual frequency ECR/RF reactor

Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical mechanisms during platinum etching by a dual frequency ECR/RF reactor have been investigated. An ion be ...

1999

High aspect ratio UV photolithography for electroplated structures

Nico de Rooij, Georges-André Racine

This paper describes single and two layer processes to realize thick resist moulds (40 and 80 μm) with a good reproducibility. The patterning of a thick AZ 4562 photoresist layer is performed with standard photolithography equipment. Different problems rel ...

1999

Light-coupling masks: An alternative, lensless approach to high-resolution optical contact lithography

Olivier Martin

We describe an approach to optical lithography using light-scattering contact masks with protruding elements that couple light into a photoresist. This method differs from conventional contact lithography in two important ways. First, because portions of t ...

1998

Energy flow in light-coupling masks for lensless optical lithography

Olivier Martin

We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of fea ...

Optical Society of America1998

Thin film pyroelectric arrays as infra-red detectors

Paul Muralt, Andreas Seifert

Pyroelectric thin film 12-element linear arrays (element size 0.4x0.9 mm(2)) have been fabricated by standard photolithography techniques on silicon substrates. A voltage responsivity of almost 800 V/W in air and 3000 V/W in vacuum is measured at low frequ ...

1997

Silicon-Based Chlorine Sensor with On-Wafer Deposited Chemically Anchored Diffusion Membrane

Nico de Rooij, Albert van den Berg

A method for on-wafer fabrication of free-chlorine sensors is described. The sensor structure consists of a planar three-electrode electrochemical cell covered with a poly(hydroxyethyl methacrylate) hydrogel membrane. This membrane is photolithographically ...

1992

High-power modular LED-based illumination systems for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

Cell-Imprint Surface Modification by Contact Photolithography-Based Approaches: Direct-Cell Photolithography and Optical Soft Lithography Using PDMS Cell Imprints

Philippe Renaud, Harald Van Lintel, Shahin Bonakdar, Hanie Kavand

New cell-imprint surface modification techni- ques based on direct-cell photolithography and optical soft lithography using poly(dimethylsiloxane) (PDMS) cell imprints are presented for enhanced cell-based studies. The core concept of engineering materials ...

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