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Coating nano particles and other substrates for efficiency enhancement, protection and obtaining new atomic structures is a widespread research topic in catalysis and material synthesis. Thus far, different approaches of coating, ranging from simplest to s ...
Ternary-based titanium nitride (TiN) thin films have drawn attention toward rational applications due to their wear resistance, high hardness, and corrosion resistance. The influence of Mo content on the structural, tribo-logical, and mechanical properties ...
The synthesis and stress characterization of metal thin-films deposited on silicon wafers were performed on this project. Two different deposition techniques were employed: magnetron sputtering and Atomic Layer Deposition (ALD). Moreover, different tests w ...
EC RF power sources will play a major role in the future operation of large scale tokamaks (ITER, DEMO). A 1MW/170GHz gyrotron is the standard RF power unit considered for ITER. Even though the efficiency of such devices has been significantly increased th ...
HfC has been very under-investigated due to its rarity and synthesising difficulty. Its potential for MEMS and NEMS applications has been recognized and is the object of an ongoing feasibility study for production since 2022. We continue on this impulse by ...
Application of a single metal or alloy is often restricted by its properties from optimal combination of performance and cost. Therefore, there is a vast need of joining dissimilar metals for various applications in biomedical, aerospace, automobile and ma ...
The aim of this project is to deposit a thin film of aluminum nitride (AlN) or aluminum scandium nitride (AlScN) on a quartz substrate showing good piezoelectric properties for use in tuning fork oscillators. Quartz oscillators are commonly used in various ...
Near-infrared luminescent materials have recently received considerable attention for a large number of applications, including in solid-state lighting, as bioimaging agents, as photovoltaic cells, and in the telecommunication industry. By adding diverse e ...
The project focuses on etching properties of the atomic layer deposition (ALD) of Al2O3. For this purpose, etching processes such as plasma etch with sulfur hexafluoride (SF6), gas etch with xenon difluoride (XeF2), wet etch with MIF developer (726 MIF) as ...
The fabrication of high-hardness non-hydrogenated diamond-like carbon (DLC) via standard magnetron sputtering (MS) is often hindered by the low sputtering yields and ionisation rates of carbon, therefore investigations into pulsed alternatives of MS, else ...