Design and fabrication of suspended-gate MOSFETs for MEMS resonator, switch and memory applications

Wireless communication systems and handset devices are showing a rapid growth in consumer and military applications. Applications using wireless communication standards such as personal connectivity devices (Bluetooth), mobile systems (GSM, UMTS, WCDMA) and wireless sensor network are the opportunities and challenges for the semi-conductor industry. The trend towards size and weight reduction, low power consumption and increased functionalities induces major technological issues. Today, the wireless circuit size is limited by the use of lots of external or "off-chip" components. Among them, quartz crystal, used as the time reference in any wireless systems, is the bottleneck of the miniaturization. Microelectromechanical systems (MEMS) is an emerging technology which has the capability of replacing the quartz. Based on similar technology than the Integrated Circuit (IC), MEMS are referred as electrostatically, thermally or piezoelectrically actuated mechanical structures. In this thesis, a new MEMS device based on the hybridization of a mechanical vibrating structure and a solid-sate MOS transistor has been developed. The Resonant Suspended-Gate MOSFET (RSG-MOSFET) device combines both advantages of a high mechanical quality factor and the transistor intrinsic gain. The physical mechanisms behind the actuation and the behavior of this device were deeply investigated and a quasi-static model was developed and validated, based on measured characteristics. Furthermore, the dynamic model of the RSG-MOSFET was created, taking into account the non-linear mechanical vibrations of the gate and the EKV model, used for MOSFET modeling. Two fabrication processes were successfully developed to demonstrate the proof of concept of such a device and to optimize the performances respectively. Aluminum-silicon (Al-Si1%) and pure silicon-based RSG-MOSFETs were successfully fabricated. DC and AC characterizations on both devices enabled to understand, extract and evaluate the mechanical and MOSFET effects. A specifically developed RF characterization methodology was used to measure the linear and non-linear behaviors of the resonator and to evaluate the influence of each polarization voltages on the signal response. RSG-MOSFET with resonant frequencies ranging from 5MHz to 90MHz and quality factor up to 1200 were measured. Since MEMS resonator quality factor is strongly degraded by air damping, a 0-level thin film vacuum packaging (10-7 mBar) process was developed, compatible with both AlSi-based and silicon-based RSG-MOSFET. The technology has the unique advantage of being done on already released structure and the room temperature process makes it suitable for above-IC integration. In parallel, a front-end compatible process was defined and major build blocks were developed in industrial environment at STMicroelectronics. This technology is based on the Silicon-On-Nothing technology, originally developed for advanced transistor, and therefore making the MEMS resonator process compatible with CMOS co-integration. DC characterizations of SG-MOSFET had shown interesting performances of this device for current switch and memory applications. Mechanical contact of the gate with the MOSFET channel induces a current switching slope greater than 0.8mV/decade, much better than the theoretical MOSFET limit of 60mV/decade. Maximum switch isolations of -37dB at 2 GHz and -27dB at 10GHz were measured on these devices. A novel MEMS-memory has been demonstrated, based on the direct charge injection to the storage media by the mechanical contact of the metal gate. Charge injection and retention mechanisms were investigated based on measured devices. Cycling study of up to 105 cycles were performed without noticing major degradations of the electrical behavior neither mechanical fatigue of the suspended gate. The measured retention time places this memory in between the DRAM and the FLASH memories. A scaling study has shown integration and compatibilities capabilities with existing CMOS.

A new versatile hybrid MEMS technology for high sensitivity, fluid proof sensing applications.

Matthias Neuenschwander

The field of micro electromechanical systems (MEMS) evolved from the microelectronic industry and the technologies developed to fabricate integrated circuits. As a result, MEMS are commonly fabricated on silicon wafers. The development of MEMS has been driven by three main merits: miniaturisation, microelectronics integration, and parallel fabrication with high precision. Many operational properties scale well with smaller sizes. In addition, integrated electronic circuitry allows embedding MEMS with computing or networking capabilities, while parallel manufacturing enables the fabrication of many identical devices on a single wafer, reducing the unit cost. The main MEMS application is transducers which transform signals from one form of energy to another, and can be used for perception (sensors) or to produce actions (actuators). Silicon and other microelectronic materials like metals have enabled very high-performance MEMS transducers because these materials can be used for a range of very effective actuating and sensing principles.More recently, polymers have started to be used in MEMS because of their unique electrical, physical and chemical properties which include biocompatibility, viscoelasticity and mechanical shock tolerance. They are also much softer than silicon or metals, and they can be processed using many techniques that allow unique low-cost, batch-style fabrication and packaging. However, polymers have relatively low glass-transition and melting temperatures. As a result, the advantages of polymers cannot easily be combined with high-performance actuating and sensing elements as these are based on silicon technology and require high-temperature fabrication steps. Here, a hybrid-MEMS fabrication process is used to address this issue. The developed devices are based on a trilayer structure, where a thick polymer core is sandwiched between two hard thin films, while electronic layers are embedded within in a fluid-compatible way.The objective of this thesis is to turn hybrid-MEMS into a benchmark MEMS technology. This involves many different aspects. First, sensing and actuation elements are integrated into trilayer devices, and their performance is analysed. Then, some more unique possibilities offered by hybrid-MEMS are exploited. A way to fabricate electronics on multiple layers is developed, which allows different electronic features to be integrated in parallel. In addition, three-dimensional bulk features fabricated at several levels are demonstrated. This is possible because the hybrid-MEMS process is based on the bonding of multiple wafers.All these new fabrication features are demonstrated in atomic force microscopy (AFM) applications. Self-actuated trilayer AFM cantilevers with sharp silicon tips are used to boost imaging speeds in the off-resonance tapping (ORT) mode, thanks to an order of magnitude faster surface probing rates. Furthermore, fully integrated ORT imaging is demonstrated with self-actuated piezoresistive cantilevers. Next, trilayer cantilevers with shielded conductive tips are introduced for electrical AFM modes. Finally, ongoing research projects are touched upon, including approaches to fabricate hybrid-MEMS with single crystal silicon piezoresistors for improved sensitivity, and an analysis of reproducibility of fabricated trilayer cantilevers.

EPFL2022

Copper / low-k technological platform for the fabrication of high quality factor above-IC passive devices

Modern communication devices demand challenging specifications in terms of miniaturization, performance, power consumption and cost. Every new generation of radio frequency integrated circuits (RF-ICs) offer better functionality at reduced size, power consumption and cost per device and per integrated function. Passive devices (resistors, inductors, capacitors, antennas and transmission lines) represent an important part of the cost and size of RF circuits. These components have not evolved at the same level of the transistor devices, especially because their performance is strongly degenerated when they scale down in size. The low resistivity silicon used to build the transistors also imposes prohibitive levels of RF losses to these passive devices. Radio frequency microelectromechanical systems (RF MEMS) are enabling technologies capable to bring significant improvement in the electrical performances and expressive size and cost reduction of these functions, with unparallel introduction of new functionalities, unimaginable to attain when using bulky, externally connected discrete components. High quality factor (Q) inductors are amongst ones of the most needed components in RF circuits and at the same time ones that are most affected by thin metallization and substrate related losses, demanding considerable research effort. This thesis presents a contribution toward the development of thick metal fabrication technologies, covering also the design, modeling and characterization of high quality factor and high self-resonant frequency (SRF) RF MEMS passive devices, with a special emphasis on spiral inductors. A new approach using damascene-like interconnect fabrication steps associated to low κ dielectrics (polyimide), highly-conductive thick copper electroplating, chemical mechanical polishing (CMP) and tailored substrate properties delivered quality factors in excess of 40 and self resonant frequencies in excess of 10 GHz, performances in the current state-of-the-art for integrated spiral inductors built on top of silicon wafers. Furthermore, the developed process steps are compatible with back-end processing used to fabricate modern IC interconnects and have a low thermal budget (< 250 °C), what makes it a good choice to build above-IC passives without degenerating the performance of passivated RF-CMOS circuits. Deep reactive ion etching (DRIE) of quartz substrates was also studied for the fabrication of spiral inductors, offering excellent RF performances (Q exceeding 40 and SRF exceeding 7 GHz). A new doubly-functional quartz packaging concept for RF MEMS devices was developed. This technique process both sides of the packaging wafer: the top is used to embed high quality factor copper inductors while the bottom is thermo-mechanically bonded to another RF MEMS wafer, offering a semi-hermetic SU-8 epoxy-based seal. The bonding process was optimized for high yield, to be compatible with SF6-plasma-released MEMS and to present low level of RF losses. Band pass filters for the GSM (1.8 GHz) and WLAN (5.2 GHz) standards were fabricated and characterized by RF measurements and full wave electromagnetic simulations. Although further development is need in order to predict the frequency response accurately, insertion losses as low as 1.2 dB were demonstrated, levels that cannot be usually attained using on-chip passives. Systematic analysis, RF measurements, electromagnetic simulations and equivalent circuit extraction were used to model the behavior of the fabricated devices and establish a methodology to deliver optimum performances for a given technological profile and specified performance targets (quality factor, inductance and frequency bandwidth). A simple yet accurate physics-based analytical model for spiral inductors was developed and proved to be accurate in terms of loss estimation for thick metal layers. This model is capable to accurately describe the frequency-dependent behavior of the device below its first resonant frequency over a large device design space. The model was validated by both measurements and full wave electromagnetic simulations and is well suited to perform numeric optimization of designs. The proposed models were also systematized in a Matlab® toolbox.

EPFL2007

Stimuli-responsive nanostructured surfaces

Ana Maria Popa

The coupling of stimuli-responsive macromolecules to nanostructured surfaces opens the perspective for the fabrication and integration of "smart" micro- and nano-electro-mechanical systems (MEMS&NEMS) in which the smallest motile unit is the polymeric chain. The goal of this work was to develop thermoresponsive, durable nanoporous surfaces as a first step toward the fabrication of functional nanocontainers and nanovalves. The proposed strategy involves in a first step the design and implementation of a clean-room compatible, reproducible and up-scalable method for defining organized nanoporous arrays in MEMS compatible surfaces, such as silicon, silicon oxide and silicon nitride. The main objective of the second step was the covalent immobilization of responsive macromolecules on the obtained structures, as to provide the later with a "smart" behavior. The nanostructuring step was realized by block-copolymer assisted lithography. This newly developed technique enables the definition of nanoscale features on semiconductor substrates over large surface areas and in a cost effective manner. A novel method for patterning thin metal films by a lift-off approach, using spin coated block-copolymer micelles monolayers as a template, was investigated. The obtained nanoporous mask was used as resist for the structuring of hard substrates in plasma-assisted processes and structures with aspect ratios as high as 1:10 were be obtained. By using different block-copolymer micelles and spin-coating conditions, the proposed approach enables the variation of the nanopores' diameter from 40 to 80 nm and a surface coverage between 11.7% and 25.5 % in an independent manner. This technique was successfully integrated in a standard microfabrication process for the batch production of thin nanoporous silicon nitride membranes. The 100 nm thick membranes span over thousands of square micrometers and present porosities higher than 109 pores/cm2. They are thus competitive in terms of porosity with the commercially available polymeric membranes. In addition they are two orders of magnitude thinner than polymeric membranes, this making them extremely interesting for applications where permeation rate or response time is important. The rapid flow of water soluble small molecular species through the nanopores was demonstrated in a qualitative manner in this work. Another series of investigations targeted the functionalization of the available nanoporous surfaces with responsive molecules. Poly(N-isopropyl acrylamide) (PNIPAAM) was chosen as a model system. Its coupling to silicon surfaces by a "grafting-to" approach from melt, using an epoxy-functionalized silane as anchoring layer was studied. The analysis of the yielded grafting density showed results superior to those obtained by classic grafting-to approaches. The relation between the polymer's weight and its responsiveness was investigated in liquid media by atomic force microscopy and by dynamic force spectroscopy. Polymers with more than 500 monomers in the back bone were shown to exhibit enhanced responsiveness. Additionally, two bioengineered polymers from the class of elastin-like polymers (ELPs) were investigated as possible candidates for the fabrication of stimuli responsive nanovalves. The molecules were synthesized in collaboration with the Bioforge group (Universidad de Valladolid, Spain) and details of the bioproduction process are presented. A method for the covalent photoattachment of macromolecules using a benzophenone-functionalized silane, was tested in this work. First the capacity of the benzophenone silane to graft synthetic thermo-responsive polymers such as PNIPAAM was demonstrated. The temperature-induced morphology change of the photografted PNIPAAM was not affected by this anchoring strategy and was monitored by tapping AFM in liquid media. The investigations were then extended to the photo-immobilization of ELPs on nanoporous silicon surfaces and the XPS measurements revealed the success of this step. However no conformation modification of the proteins could be evidenced by tapping-mode AFM in liquid media under different ionic strengths.

EPFL2009