Publication

Stencil Lithography – Quick & Clean Surface Patterning at Mesoscopic Scales

Publications associées (144)

Multilevel Micro-Structuring of Glassy Carbon for Precision Glass Molding of Diffractive Optical Elements

Hans Peter Herzig, Toralf Scharf, Karin Prater

A consumer market for diffractive optical elements in glass can only be created if high efficient elements are available at affordable prices. In diffractive optics the efficiency and optical properties increases with the number of levels used, but in the ...

Spie-Int Soc Optical Engineering2015

In-plane fabrication of insulated gold-tip probes for electrochemical and force spectroscopy molecular experiments

Nico de Rooij, Terunobu Akiyama, Sebastian Gautsch, Peter Van der Wal, Yexian Wu

A new and versatile fabrication process of insulated gold tip probes for atomic force microscopy (AFM) is presented by Wu et al. (In-plane fabricated insulated gold-tip probe for electrochemical and molecular experiments, in: 2013 IEEE 26th International C ...

Elsevier2014

In-Plane Fabricated Insulated Gold-Tip Probe For Electrochemical And Molecular Experiments

Nico de Rooij, Terunobu Akiyama, Sebastian Gautsch, Peter Van der Wal, Yexian Wu

In this contribution we present a scanning probe with a gold-tip completely encapsulated with insulator all the way to the apex. The probe fabrication is unique owing to an in-plane arrangement in which the width of the cantilever is defined by deep reacti ...

IEEE2013

Low-NA focused vortex beam lithography for below 100-nm feature size at 405 nm illumination

Hans Peter Herzig, Toralf Scharf, Myun Sik Kim

There are varieties of novel methods, which demonstrate the super-resolution. For instance, an optically trapped sub-micron dielectric sphere serves as a near-field focusing lens to directly write patterns of ~100 nm in liquid, and accelerated metallic nan ...

Spie-Int Soc Optical Engineering2013

Metal-coated silicon micropillars for freestanding 3D-electrode arrays in microchannels

Carlotta Guiducci, Samuel Kilchenmann, Elena Bianchi, Enrica Rollo

This paper presents a fabrication process for arrays of high-aspect-ratio micropillar electrodes, which are freestanding 3D structures that feature metal sidewalls connected to passivated planar wires. Facing vertical electrodes are considered to be a key ...

Elsevier2013

A High-Efficiency Nonuniform Grating Coupler Realized With 248-nm Optical Lithography

Christophe Marcel Georges Galland, Yang Liu

We describe a high-efficiency grating coupler (GC) fabricated on a silicon-on-insulator wafer with 220 nm top silicon layer. One single 60 nm shallow etch is required to define the diffractive gratings with a minimum lithographic feature size of 180 nm, wh ...

Institute of Electrical and Electronics Engineers2013

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Cristina Martin Olmos, Oscar Vazquez Mena, Katrin Sidler Arnet

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

MDPI2013

Méthode de décapage sélective d'un matériau sur un substrate en quartz par l'utilisation d'un faisceau -induit

Patrik Willi Hoffmann, Michel Rossi, Tristan Bret, Xavier Multone

A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is particularly suitable for electron beam induced etching of chro ...

2012

Conductivity of SU-8 Thin Films through Atomic Force Microscopy Nano-Patterning

Nico de Rooij, Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos, Peter Van der Wal

Processing fl exibility and good mechanical properties are the two major reasons for SU-8 extensive applicability in the micro-fabrication of devices. In order to expand its usability down to the nanoscale, conductivity of ultra-thin SU-8 layers as well as ...

Wiley-Blackwell2012

Reflow Of Non-Circular Nano-Pillars To Fabricate Nano-Scale Solid Immersion Lenses

Hans Peter Herzig, Toralf Scharf, Myun Sik Kim

We investigate the reflow of non-circular, i.e., triangular and square, shaped pillars to fabricate nano-scale solid immersion lenses (SILs). Electron beam lithography (EBL) and thermal reflow are the core of the fabrication process. For the optical charac ...

Ieee2012

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