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Fluoropolymer coating of medical grade poly(vinyl chloride) by plasma-enhanced chemical vapor deposition techniques

Publications associées (55)

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Vanadium dioxide thin films were deposited on amorphous SiO2-coated Si substrates, by reactive magnetron sputtering at 490 °C of a pure vanadium target. The deposition parameters were optimized in order to maximize the resistivity modulation due to the met ...

Elsevier2015

Sputtered titanium oxynitride coatings for endosseous applications: Physical and chemical evaluation and first bioactivity assays

Rosendo Sanjines, Alessandro Pontearso

Titanium oxynitride coatings (TiNxO3,) are considered a promising material for applications in dental implantology due to their high corrosion resistance, their biocompatibility and their superior hardness. Using the sputtering technique, TiNxO3, films wit ...

Elsevier Science Bv2014

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W7X stellarator 3D equilibrium has been computed with the equilibrium code ANIMEC (Anisotropic Neumann Inverse Moments Equilibrium Code). This equilibrium was used to model ICRH minority heating in 4He(H) plasma with the 3D full-wave code LEMan (Low freque ...

2014

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Recently, compact uniform and adhesive films of Ag and Cu have been prepared by DC-magnetron sputtering (DC), pulsed DC magnetron sputtering (DCP) and high power impulse magnetron sputtering (HIPIMS). This study reports the HIPIMS deposition for Ag and Cu ...

Elsevier Science Sa2014

This work consists in an experimental study of the main parameters governing the transport of heat across an interface between two solids, when it is dominated by phonons. The main experimental tool used is Time-Domain ThermoReflectance (TDTR), which is an ...

EPFL2013

The rational synthesis of novel materials requires the control over the arrangement of matter in order to meet the desired properties for applications and devices. Ultimately, control means to define the place of each atom and determine its chemical state, ...

EPFL2013

High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Michael Oliver Reinke

Thin films of oxide materials are widely used for various types of applications. The selection of an appropriate deposition method depends on the aimed material and application. We review here a high vacuum chemical vapour deposition (HV-CVD) method, which ...

Elsevier2013

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The interplay of gas flow and depletion by plasma dissociation determines the spatial distribution of species and the deposition uniformity in a plasma source. Many plasma reactors use a gas showerhead and the design of the flow dynamics is a critical aspe ...

2012

Dispersion engineering of thick high-Q silicon nitride ring-resonators via atomic layer deposition

Tobias Kippenberg, Victor Brasch, Tobias Herr

We demonstrate dispersion engineering of integrated silicon nitride based ring resonators through conformal coating with hafnium dioxide deposited on top of the structures via atomic layer deposition. Both, magnitude and bandwidth of anomalous dispersion c ...

Optical Society of America2012

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Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and de ...

2011